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  4. Thin film forming device plasma CVD device (SHINKO SEIKI CO., LTD.)
Thin film forming device plasma CVD device-Road lock type plasma CVD device
Thin film forming device plasma CVD device-SHINKO SEIKI CO., LTD.

Thin film forming device plasma CVD device
SHINKO SEIKI CO., LTD.

About This Product

It is a large plasma CVD device that supports 600mm board. It is possible to form a dense silicon oxide film and is suitable for producing thin film capacitors.

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    Thin film forming device plasma CVD device

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1 Models of Thin film forming device plasma CVD device

Image Part Number Price (excluding tax) subject Processable range processing time Film thick distribution Thickening Gas used Main exhaust vacuum pump RF power supply for discharge Baseboard heating heater operation
Thin film forming device plasma CVD device-Part Number-Road lock type plasma CVD device

Road lock type plasma CVD device

Available upon quote

For production

600 x 600 (mm)

About 4.5 hours / batch (SIO2 15μ μ)

560x560 (mm) 7%or less

15μm (SIO2)

AR, N2O, SIH4 (AR diluted): Nitrogen (for vent, for purge)

Oil diffusion pump (option: turbo molecular pump)

13.56MHz (1.5kW)

Heat temperature 360 ​​° C ± 10 ° C C (up to 380 ° C)

Fully automatic by touch panel

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About Company Handling This Product

SHINKO SEIKI CO., LTD.

Company Overview

SHINKO SEIKI CO., LTD., established in 1949, and located in Kobe, Japan, is a manufacturer of vacuum devices, ...

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  • Japan

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ALD Systems
ALD Systems　SHINKO SEIKI CO., LTD.
SHINKO SEIKI CO., LTD.

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