SHINKO SEIKI CO., LTD.'s Company Profile and Products

This is the latest type etching device that customizes the configuration and gas system for metal from the basic configuration ...

• Machining / Machine Tools

• Etching Equipment

This is a dedicated system that continuously processed plasma surface treatment of flexible substrates such as resin film and m...

• Machining / Machine Tools

• Plasma Processing Equipment

It is a new multi -chamber type etching device that can equip multiple etching rooms. Equipped with 2 newly developed ICP etch...

• Machining / Machine Tools

• Plasma Processing Equipment

EXAM is a multipurpose plasma etching device that can handle multiple purposes that make use of the know -how of semiconductor ...

• Machining / Machine Tools

• Plasma Etching Systems

The surface wave plasma (SWP), which can generate a large area of ​​high -density plasma, is used for many purposes such as ass...

• Machining / Machine Tools

• Plasma Etching Systems

SERIO is a high -density plasma etched device equipped with high density ICP plasma sauce. The proprietary development process ...

• Machining / Machine Tools

• Plasma Etching Systems

A plasma surface treatment device that uses a parasma of a parallel flat plate type RIE method that enables treatment such as c...

This is the latest sputter ring device that can be flexible regardless of the substrate or application, such as SI wafer, glass...

• Machining / Machine Tools

• Sputtering Equipment

It is a road rock -type sputtering device that realizes space. The maximum φ270 tray can be set as standard in the cassette roo...

• Machining / Machine Tools

• Sputtering Equipment

This is a lineup of batch -type sputtering devices that are ideal for mass production from various electronic devices and high ...

• Machining / Machine Tools

• Sputtering Equipment

It is a passion -type inline type sputtering device for glass substrates. The rectangular cathode is equipped with a multi -un...

• Machining / Machine Tools

• Sputtering Equipment

This is the latest RTOR type film model device that realizes not only resin but also metal foil continuous winding processing. ...

• Machining / Machine Tools

• Sputtering Equipment

It is an ultra -high vacuum compatible sputtering device with a 10 -PA background exhaust performance in the spatta room. It c...

• Machining / Machine Tools

• Sputtering Equipment

It is a compact hard configuration that is ideal for experiments and basic research. We provide low -cost and reliable hardware...

• Machining / Machine Tools

• Sputtering Equipment

It is a bestseller type that boasts a wealth of track record in the production process of individual semiconductors and compoun...

• Machining / Machine Tools

• Vacuum Vapor Deposition Devices

This is a dedicated vapor equipment that supports the expanded lift off process. The verticality of high evaporation particles ...

• Machining / Machine Tools

• Vacuum Vapor Deposition Devices

Special specification for electronic devices. Specializes in special processes and devices, and is flexible regardless of the s...

• Machining / Machine Tools

• Vacuum Vapor Deposition Devices

Ideal for production of small electronic components such as the end of the resistor, the electrode formation of the crystal vib...

• Machining / Machine Tools

• Vacuum Vapor Deposition Devices

It is a low -cost small vapor equipment that supports basic research experiments. Various aspects such as evaporation mechanism...

• Machining / Machine Tools

• Vacuum Vapor Deposition Devices

It is a large vapor advertisement that corresponds to the film for decorating the exterior of the car. It is possible to vapor ...

• Machining / Machine Tools

• Vacuum Vapor Deposition Devices

It is a large plasma CVD device that supports 600mm board. It is possible to form a dense silicon oxide film and is suitable fo...

• Machining / Machine Tools

• Plasma-Enhanced CVD

This is a device that forms a monomer gas introduced in a vacuum chamber by high frequency and forms a polymer film on the subs...

This is a device that forms a monomer gas introduced in a vacuum chamber by high frequency and forms a polymer film on the subs...

This is a new iontelling device that has been realized by PVD of film species (thick film oxide film, carbide, etc.) that could...

It is an fully automatic sputtering device equipped with a high -density magnetron cats (arc discharge -type magnetron codel) d...

• Machining / Machine Tools

• Sputtering Equipment

Using a proprietary pig plasma source, you can form a high -rate and smooth DLC film. It is often used for surface treatment of...

The proprietary development law allows evaporation particles to be ionized in high air. It has a lot of track record for many y...

The proprietary development law allows evaporation particles to be ionized in high air. It has a lot of track record for many y...