Product
Thin film forming device batch sputtering deviceHandling Company
SHINKO SEIKI CO., LTD.Items marked with have different values depending on the model number.
Click on the part number for more information about each product
Product Image | Part Number | Price (excluding tax) | Base board / substrate heating | Base platform / membrane thick distribution | Base platform / rotation mechanism | Exhaust system / Achievement power | Exhaust system / exhaust time | Exhaust system / main pump | Gas introduction system | Operation method / exhaust operation | Operation method / film formation operation | Processing board | Spatta power supply / DC | Sputta direction | Sputta power supply / RF | Target / Cathode type | Target / Size x number |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
SRV4310 |
Available upon quote | 300 ° C on the board stand | Within ± 10%(¢ 210) | ◯ | 6.0 x 10-⁵ PA or less | 9.9 X 10-⁴ PA within 10 minutes | Cry -pump | Two systems | Automatic | Half -automatic (timer type) | ¢ 320mm | option | up | 500W | Plena magnetron | ¢ 100mm x 3 | |
SRV6310 |
Available upon quote | 300 ° C on the board stand | Within ± 10%(¢ 300) | ◯ | 6.0 x 10-⁵ PA or less | 9.9 X 10-⁴ PA within 10 minutes | Cry -pump | Two systems | Automatic | Half -automatic (timer type) | ¢ 320mm | option | up | 1kw | Plena magnetron | ¢ 150mm x 3 | |
SRV7310 |
Available upon quote | 300 ° C on the board stand | Within ± 10%(¢ 420) | ◯ | 6.0 x 10-⁵ PA or less | 9.9 X 10-⁴ PA within 10 minutes | Cry -pump | Two systems | Automatic | Half -automatic (timer type) | ¢ 520mm | option | up | 3kw | RMC | ¢ 200mm x 3 |
Click on the part number for more information about each product