Rigid membrane formation device Arc discharge type magnetron Pattadling device
SHINKO SEIKI CO., LTD.
About This Product
It is an fully automatic sputtering device equipped with a high -density magnetron cats (arc discharge -type magnetron codel) developed independently.
The newly developed arc discharge -type magnetron cathode is characterized by low pressure, low voltage, and large current films than conventional cathodes.
The unique high -density plasmaspatta allows you to form a precise and smooth hard membrane that cannot be obtained by other PVD methods. The film quality is dense and has a structure close to bulk due to fine crystals.
It is also very good for the surface smoothness of the membrane. A hard nitride membrane and a carbonated film that does not require a post -processing (such as grain) can be filmed.
It is a great advantage, especially in coating such as molds and cutting tools. In addition, hydrogen -free DLC film (carbonated nitride) is also possible, and is being developed to improve the sliding properties of automotive parts.
This device has a commonization of a PIG -type DLC membrane formation device with abundant achievements.
The Arc discharge type magnetron cats can be equipped with a maximum of 4 yuan and a PIG -type plasma gun for the DLC membrane.
It is extremely effective for the formation of a composite multilayer film at the nano -level and the creation of a new alloy thin film.
ADMS (Arc discharge -type magnetronon spatta) hard film + PIG type DLC sliding film can be expected to develop usage use as a surface treatment technology for the PIG type DLC membrane formation device.
The TIN membrane by the Arc discharge -type magnetopatta has a more precise film tissue than the conventional magnetron spatta.
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Product
Rigid membrane formation device Arc discharge type magnetron Pattadling device
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Handling Company
SHINKO SEIKI CO., LTD.
1 Models of Rigid membrane formation device Arc discharge type magnetron Pattadling device
| Product Image | Part Number | Price (excluding tax) | Coating area | Memorial / CR system | Memorial type / TI system | Throughput | Treatment |
|---|---|---|---|---|---|---|---|
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Arc discharge type magnetron Pattadling device |
Available upon quote | Φ600 × 500L | CRN, AICR, etc. | Tin, cin, tiain, etc. | 12 in the case of φ140 x 500L (self -revolution) | Mold vehicle parts cutting tools, such as horned tools, etc. |
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About Company Handling This Product
- Japan
- Since 1949