Rigid membrane formation device Arcfiramento -type ion Plating device
SHINKO SEIKI CO., LTD.
About This Product
This is a new iontelling device that has been realized by PVD of film species (thick film oxide film, carbide, etc.) that could only be put into practical use in CVD.
The "Arcfiramento -type ion Plating device" efficiently ionizates the evaporated painting particles by collisions between evaporating particles and thermoelectric on the evaporation source.
Furthermore, the reaction of the introduced gas and the ionized evaporated particles can form a dense and close adhesion of various reactions (nitride film, oxide, carbide, and carbide film).
With the conventional "Ark discharge type iontelling device", the thick formation of the oxide film, which was difficult, can now be performed.
New PVD membranes that can be formed by the arcfiramento -type iontelling device are expected to be developed for many uses, such as precision molds and semiconductor manufacturing equipment parts.
Arcfiramento-type ion Plating device (AF-IP device)
Corresponding membrane
Oxide membrane: Itoria (Y203) * New development membrane
Oxide membrane: Alumina (AI203) * New development membrane
Carbonized film: SIC * New development membrane
Nitride: TIN
Nitride membrane: CRN
Other metal and reaction membrane
-
-
Product
Rigid membrane formation device Arcfiramento -type ion Plating device