Vacuum direct vaporization type-thin film formation device DH-CVD
SAKIGAKE-Semiconductor
About This Product
The industry's first safe plasma CVD that directly forms a film from a liquid raw material.
■ Product overview
･ Thin film formation device that applies the unique “DH-CVD” technology
･ Organic metal materials can be used safely without using dangerous gas
･ Low cost because there is no need for liquid vaporization devices and flow control devices
･ Thin film formation is possible with simple operations
･ Easy to handle raw materials than gas
■ Silamon -produced solution
･ Combination solution 1 SIO2 membrane solution
･ Combination liquid 2 carbon hydrogen membrane/containing element selection solution (Custom compound according to request)
･ 3 metal oxide solution (custom compound according to the request)
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Product
Vacuum direct vaporization type-thin film formation device DH-CVD
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Handling Company
SAKIGAKE-Semiconductor
1 Models of Vacuum direct vaporization type-thin film formation device DH-CVD
| Product Image | Part Number | Price (excluding tax) | Discharge system | Electrode stage | Exhaust flow adjustment adjustment | External dimensions | Gas introduction | High -voltage power supply | Output adjustment | Vacuum gauge | power supply | timer | weight |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
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DH-CVD |
Available upon quote | Exchange parallel flat plate type | Diameter 400mm stainless steel (optional can be changed) | None (additional as options) | 560mm (W) x 560mm (d) x 400mm (H) | none | Exchange (synchronized with power frequency) | Manual adjustment | None (additional as options) |
Single phase 200V, 15A (50Hz/60Hz) * Includes pump power supply |
Set plasma irradiation time between 0 to 9,999 seconds | 200kg |
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