High-frequency power supply vacuum plasma device US-80A-US-80A
High-frequency power supply vacuum plasma device US-80A-SAKIGAKE-Semiconductor

High-frequency power supply vacuum plasma device US-80A
SAKIGAKE-Semiconductor


About This Product

Up to 80 plasma processing is possible with a maximum of 500ml bottles at a time. By replacing the electrode, it supports bottles with various capacity and shape. ■ Use ・ Inner and outer surface modification device ・ Treatment in cell culture containers ・ Preparing surface printing of metal containers such as PET bottles, glass bottles, cans ■ Optional Power supply 3 phase 200V15A + single -phase 200V15A, pressure air CDA0.3MPa * Vacuum pumps are sold separately. In addition, we accept specification changes separately.

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    High-frequency power supply vacuum plasma device US-80A




*Please note that we may not be able to accommodate sample requests.

1 Models of High-frequency power supply vacuum plasma device US-80A

Product Image Part Number Price (excluding tax) External dimensions Gas introduction Operating system Processing pressure adjustment Throughput power supply weight
High-frequency power supply vacuum plasma device US-80A-Part Number-US-80A

US-80A

Available upon quote W745mm, D695mm, H1,445mm (lid closing, without protrusions) Automatic flow control by 1 system, MFC Touch panel APC process pressure automatic control 80 / batch (when using Iboy 500ml bottle (diameter 75mm, height 160mm)) 13.56MHz max.1kw Approximately 250kg

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