Powder treatment Small rotation type vacuum plasma device MUG-80
SAKIGAKE-Semiconductor
About This Product
■ Product overview
･ Introduced a rotating stirring mechanism in the vacuum chamber
･ Dry type and full -length processing
･ Stir during glow discharge to ensure high uniformity
･ Because of the rotation type, there is no need to reit the small parts such as chip.
･ Etching of powder and small parts, thin film formation, water repelliation, oxidation reduction
-
Product
Powder treatment Small rotation type vacuum plasma device MUG-80
-
Handling Company
SAKIGAKE-Semiconductor
1 Models of Powder treatment Small rotation type vacuum plasma device MUG-80
| Product Image | Part Number | Price (excluding tax) | External dimensions | Gas control method | Gas system | Pressure adjustment | Rotation part | power supply | weight |
|---|---|---|---|---|---|---|---|---|---|
|
|
MUG-80 |
Available upon quote | 400mm (W) x 353mm (d) x 340mm (H) | option | option | option | φ80 × 42mm (D) | 100V, 15A (50Hz/60Hz) | 30kg |
Customers who viewed this product also viewed
Other products of SAKIGAKE-Semiconductor
View more products of SAKIGAKE-Semiconductor
