Powdered body processing rotary table vacuum plasma device YHS-Dφs
SAKIGAKE-Semiconductor
About This Product
Ideal for processing powder and chip capacitors.
A rotating mechanism has been added to the vacuum plasma so that the entire surface can be processed at once.
■ Product overview
･ High processing effect for surface modification / cleaning / hydrophilic treatment
･ Batch processing of the front and back by rotating chamber
･ The surface treatment of the powder is possible in the dry environment
･ Distribute rotating tubular electrodes in the chamber
･ Discharge high -frequency to the electrode in the center facing cylindrical electrodes
-The processing work rolls in the rotating chamber and can be processed in front and back lump.
･ Washing resin -produced products ･ Washing pre -treatment MEMS cleaning, etc. ･ Etching of powder and small parts for powdered surface treatment in a dry environment ･ Light film formation ･ Water repelliation ･ Reduction oxidation.
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Product
Powdered body processing rotary table vacuum plasma device YHS-Dφs
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Handling Company
SAKIGAKE-Semiconductor
1 Models of Powdered body processing rotary table vacuum plasma device YHS-Dφs
| Product Image | Part Number | Price (excluding tax) | External dimensions | Gas control method | Gas system | Rotation part | power supply | weight |
|---|---|---|---|---|---|---|---|---|
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YHS-Dφs |
Available upon quote | 820mm (W) x 600mm (d) x 680mm (H) | Needle valve (mass flow controller is optional) | 1 system (2 or more systems are optional) | φ210 × 200mm (d) | 100V, 30A (50Hz/60Hz) | 100kg |
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