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  4. Attotive pressure (direct) Plasma device in the liquid DKN-128 (SAKIGAKE-Semiconductor)


Attotive pressure (direct) Plasma device in the liquid DKN-128-DKN-128
Attotive pressure (direct) Plasma device in the liquid DKN-128-SAKIGAKE-Semiconductor

Attotive pressure (direct) Plasma device in the liquid DKN-128
SAKIGAKE-Semiconductor

About This Product

■ Product overview ･ Improvement of diversification of powder by plasma in the liquid ･ We will improve production efficiency by continuous processing. ･ Plasma processing while crushing aggregation with impact ･ For plating preprocessing to the powder

  • Product

    Attotive pressure (direct) Plasma device in the liquid DKN-128



*Please note that we may not be able to accommodate sample requests.

1 Models of Attotive pressure (direct) Plasma device in the liquid DKN-128

Product Image Part Number Price (excluding tax) External dimensions
Attotive pressure (direct) Plasma device in the liquid DKN-128-Part Number-DKN-128

DKN-128

Available upon quote (W) 685mm x (d) 425mm x (H) 440mm

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