CPE-200ahm with vacuum plasma etcher heating mechanism
SAKIGAKE-Semiconductor
About This Product
High -speed and high efficiency by heating SIO2 and SI etching and organic products.
■ Product overview
･ Newly heated stage heated in the plasma etcher CPE series
･ Heating up to up to 400 ° C
･ For shortening processing time, for acceleration test for endurance tests
･ Easy operation with a touch panel (plasma operation unit)
･ High -precision temperature control by PID control
-
Product
CPE-200ahm with vacuum plasma etcher heating mechanism
-
Handling Company
SAKIGAKE-Semiconductor
1 Models of CPE-200ahm with vacuum plasma etcher heating mechanism
| Product Image | Part Number | Price (excluding tax) | Electrode stage | External dimensions | Gas introduction | Stage heating | power supply |
|---|---|---|---|---|---|---|---|
|
|
CPE-200ahm |
Available upon quote | 200mm in diameter | W560mm x D690mm x H1,650mm | Two systems | Maximum temperature 400 ° C | Single phase 200V, 30A |
Customers who viewed this product also viewed
Other products of SAKIGAKE-Semiconductor
View more products of SAKIGAKE-Semiconductor
