Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G
SAKIGAKE-Semiconductor
About This Product
A vacuum plasma device that can introduce various gases. Gas flow adjustment, power adjustment, and vacuum monitor You can set the precise processing conditions.
We will provide simple operability of one touch, inexpensive price range that is easy to introduce.
Surface treatment treatment before the formation of thin film formation before coating before coating and in other bios and medical fields.
■ Optional
･ Multiple conversion of gas introduction
･ Expansion / reduction of stage size
･ RF type
We accept optional charges such as. Please contact us for details.
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Product
Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G
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Handling Company
SAKIGAKE-Semiconductor
1 Models of Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G
| Product Image | Part Number | Price (excluding tax) | External dimensions (mm) | Stage dimension (mm) |
|---|---|---|---|---|
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YHS-G |
Available upon quote | 562 (W) x 562 (D) x 360 (H) | φ100 ~ |
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