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  4. Sputtering technology Applied screw stirring powder sputtering device (Japan Create Co., Ltd.)
Sputtering technology Applied screw stirring powder sputtering device-Screw stirring powder sputtering device
Sputtering technology Applied screw stirring powder sputtering device-Japan Create Co., Ltd.

Sputtering technology Applied screw stirring powder sputtering device
Japan Create Co., Ltd.

💻 Electronics & Electrical Use ⚡ Energy Industry Use 🧪 Chemical Industry Use

Japan Create Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

185.3hours

Company Review

5.0

About This Product

■ Overview

This is a device that uses sputtering technology that we are good at, and forms a variety of three -dimensional metals, ceramic, and resin products. In addition to this, various devices such as smaller/large -size, CVD/various plasma processing, barrel/drum type can be proposed.

■ Characteristics

・ Space saving large capacity ・ Equipped with our own spatta cathode ・ Screw type stirring mechanism

■ Use

·cosmetics ・ Electronic components ・ Battery parts ・ High -performance material development

  • Product

    Sputtering technology Applied screw stirring powder sputtering device

  • Usage Scenarios

    Electronics & Electrical Use / Energy Industry Use / Chemical Industry Use

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1 Models of Sputtering technology Applied screw stirring powder sputtering device

Image Part Number Price (excluding tax) work Sputta Cathode Spatta power supply Process gas Vacuum exhaust Pressure control Control operation Data logging Work introduction/collection option
Sputtering technology Applied screw stirring powder sputtering device-Part Number-Screw stirring powder sputtering device

Screw stirring powder sputtering device

Available upon quote

Up to 18L. Please contact us as it differs depending on the shape, size, material, etc.

Magnetron method

RF or DC

AR, O2, N2, etc.

Diffusion pump+RP

APC control

Control: PLC
Operation: Touch panel or PC

External memory or PC

Upper lid opening and closing turn type

Heated cooling mechanism, multi-spatta cathode, target shutta, reverse spatta, Moving magnet, magnetic material target cathode, clio trap, light emitting analysis system, Q-MASS, etc.

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About Company Handling This Product

Japan Create Co., Ltd.

Response Rate

100.0%

Response Time

185.3hrs

Company Review

5.0
  • Japan

Related search keywords

Sputtering Equipment
Sputtering Equipment　Japan Create Co., Ltd.
Japan Create Co., Ltd.

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