Pressure film forming sputtering device
Japan Create Co., Ltd.
About This Product
■ Characteristics
・ Continuous film is possible from single crystal epitaxial buffer layer to piezoelectric membrane
・ Elementary detection that contributes to a decrease in piezoelectric characteristics by installing a plasma emission monitor
・ Deposition structure that maximizes the axle length that contributes to piezoelectric power
・ Equipped with our own spatta cathode
・ It also supports moving magnets and can be fully erotic
・ Equipped with our own rapid rising temperature drop board heating mechanism and realizes the board temperature of 900 ° C.
・ High -speed and stable reactive spatta film formation is possible by plasma analysis and feedback control by light emission analysis system.
・ Trail transport is also available
・ Combination of CVD rooms, vapor rooms, plasma blacking rooms, etc. is also available
■ Use
·semiconductor
・ MEMS
・ Electronic components
・ Optical parts
・ In -vehicle parts
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Product
Pressure film forming sputtering device
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Handling Company
Japan Create Co., Ltd.
1 Models of Pressure film forming sputtering device
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Pressure film forming sputtering device |
Available upon quote |
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About Company Handling This Product
- Japan
- Since 1963
- 40 employees