Unique plasma control method plasma CVD device
Japan Create Co., Ltd.
About This Product
■ Characteristics
・ Chamber volume 1m3
・ Unique plasma control method
・ Multi -stage multi -dose batch processing is possible
・ Simple structure with high versatility
・ Silence can be made in various product materials
・ Control for a wide range of membrane characteristics
・ Abundant accumulation data
■ Use
・ Various tools
・ Sliding parts
・ Ornament
·Auto parts
・ Machine parts
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Product
Unique plasma control method plasma CVD device
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Handling Company
Japan Create Co., Ltd.
1 Models of Unique plasma control method plasma CVD device
| Product Image | Part Number | Price (excluding tax) | Chamber size | Control operation | Data logging | Pressure control | Self -cleaning gas | Simamed film species | Vacuum exhaust | Work size | option |
|---|---|---|---|---|---|---|---|---|---|---|---|
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Plasma CVD device for three -dimensional materials |
Available upon quote | 1m x 1m x 1m |
Control: PLC Operation: Touch panel or PC |
External memory or PC | APC control | O2, AR, etc. |
DLC, fluidized DLC SIOX, SION |
Mbp+RP | Please contact us as it depends on the shape, size, and material. | Dedicated electrode, gas detector, cylinder cabinet, etc. according to the work |
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About Company Handling This Product
- Japan
- Since 1963
- 40 employees