Bachelor Plasma Clearing System carbon nanotube synthetic device-Carbon nanotube synthetic device
Bachelor Plasma Clearing System carbon nanotube synthetic device-Japan Create Co., Ltd.

Bachelor Plasma Clearing System carbon nanotube synthetic device
Japan Create Co., Ltd.


About This Product

■ Characteristics ・ CNT synthesis is possible automatically ・ Equipped with a board plasma cleaning system ・ Realizes excellent substrate temperature distribution and gas flow method ・ Realizes excellent membrane thickening and reproducibility ・ Abundant accumulation data ■ Use ・ Energy -related ・ Materials related ・ Bio -related ・ Nanotechnology related ・ Electronics related

  • Product

    Bachelor Plasma Clearing System carbon nanotube synthetic device




*Please note that we may not be able to accommodate sample requests.

1 Models of Bachelor Plasma Clearing System carbon nanotube synthetic device

Product Image Part Number Price (excluding tax) Board heating temperature Board size CNT synthetic gas Control operation Data logging Pressure control Vacuum exhaust option
Bachelor Plasma Clearing System carbon nanotube synthetic device-Part Number-Carbon nanotube synthetic device

Carbon nanotube synthetic device

Available upon quote Up to 800 ° C (substrate surface) Maximum φ12 inch CH system, H2 Control: PLC
Operation: Touch panel or PC
External memory or PC APC control RP Automatic transport system, gas detector, cylinder cabinet, etc.

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About Company Handling This Product

Japan Create Co., Ltd.

  • Japan
  • Since 1963
  • 40 employees

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