Oxide membrane / nitride film plasma CVD device
Japan Create Co., Ltd.
About This Product
■ Characteristics
・ Realizes low stress, high hardness, and high insulation by 2 frequency independent sealing method.
・ Realizes excellent membrane thickening and reproducibility
・ Metal contamination reduction by special surface treatment
・ Significant particle reduction and productivity improvement by radical plasma cleaning system
・ Control for a wide range of membrane characteristics
・ Abundant accumulation data
・ It can also be used for tray transportation
■ Use
·semiconductor
・ MEMS
・ Organic EL
・ Solar cells
・ Electronic components
・ Optical parts
-
Product
Oxide membrane / nitride film plasma CVD device
-
Handling Company
Japan Create Co., Ltd.
1 Models of Oxide membrane / nitride film plasma CVD device
| Product Image | Part Number | Price (excluding tax) |
|---|---|---|
|
|
Oxide membrane / nitride film plasma CVD device |
Available upon quote |
Customers who viewed this product also viewed
Other products of Japan Create Co., Ltd.
View more products of Japan Create Co., Ltd.
About Company Handling This Product
- Japan
- Since 1963
- 40 employees