Product
Sputtering technology Applied screw stirring powder sputtering deviceHandling Company
Japan Create Co., Ltd.Product Image | Part Number | Price (excluding tax) | Control operation | Data logging | Pressure control | Process gas | Spatta power supply | Sputta Cathode | Vacuum exhaust | Work introduction/collection | option | work |
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Screw stirring powder sputtering device |
Available upon quote |
Control: PLC Operation: Touch panel or PC |
External memory or PC | APC control | AR, O2, N2, etc. | RF or DC | Magnetron method | Diffusion pump+RP | Upper lid opening and closing turn type | Heated cooling mechanism, multi-spatta cathode, target shutta, reverse spatta, Moving magnet, magnetic material target cathode, clio trap, light emitting analysis system, Q-MASS, etc. | Up to 18L. Please contact us as it differs depending on the shape, size, material, etc. |