Product
Equipped with unique spatta catsHandling Company
Japan Create Co., Ltd.Product Image | Part Number | Price (excluding tax) | Control operation | Data logging | Pressure control | Process gas | Spatta power supply | Sputta Cathode | Vacuum exhaust | Work mounting | Work size | Workstage | option |
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Three -dimensional sputtering device |
Available upon quote |
Control: PLC Operation: Touch panel or PC |
External memory or PC | APC control | AR, O2, N2, etc. | RF or DC | Magnetron method, target shutter | TMP+RP | Upper lid hiring rotation opening and closing type | Up to φ5 inch x 40mm high. Please contact us as it differs depending on the shape, size, material, etc. |
Heat temperature: 500 ° C (stage surface) Rotation: 30rpm Open Rid: 10RPM Railway: 40mmst Tilt mechanism: ± 30 ° Baseboard bias (RF or DC) |
Cooling (low-temperature film), moving magnet, cathode for magnetic material targets, dried pumps, light emitting analysis systems, Q-MASS, etc. |