Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation
Japan Create Co., Ltd.
About This Product
■ Characteristics
・ Ideal for single crystal film by epitaxial promotion mechanism
・ Oxidation promotion gas introduction mechanism
・ Material oxidation prevention mechanism
・ A high temperature process of up to 900 ° C is possible
・ Realizes excellent membrane thickening and reproducibility by substrate rotation
・ Compatible with high vacuum processes by road lock type
・ Particle reduction by optimal surface treatment
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Product
Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation
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Handling Company
Japan Create Co., Ltd.
1 Models of Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation
| Product Image | Part Number | Price (excluding tax) | Board heating temperature | Board size | Control operation | Data logging | Slamy thickness control | Steamed material | Transportation of the board | Vacuum exhaust | option |
|---|---|---|---|---|---|---|---|---|---|---|---|
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Epitaxial-EB vapor packing device |
Available upon quote | 700 ° C (substrate surface) | Maximum φ12 inch |
Control: PLC Operation: Touch panel or PC |
External memory or PC | Crystal type thick sensor | Metal or oxide | Vacuum transport robot | CP+DP | Bachelor heating 900 ° C (board surface), substrate cooling, substrate bias, substrate rotation, resistant heating steaming (up to 6 units), reaction gas supply unit, etc. |
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About Company Handling This Product
- Japan
- Since 1963
- 40 employees