Multi -layer film sputtering device S600
Panasonic Production Engineering Co., Ltd.
About This Product
■ Features
・ Both a variety of processes and high productivity with up to 5 cathodes
・ Maintenance of long -term hyperchd and uniformity by adjusting T/S distance
・ Improve spatta thin film characteristics with proprietary plasma control (MP spatta) technology
・ High temperature process is possible with a heater stage (800 ° C)
・ It can be used for various applications from development processes to mass production processes
■ Up to 5 cathodes can be mounted
・ Realizes high productivity in the double load lock room
・ Combine a variety of processes and high throughput in a transport form that combines rotary type and multi -chamber type.
・ Various units can be attached to each position ・ DC/RF cathode ・ MP spatta (proprietary technology) ・ Reverse spatta ・ back side spatta ・ AR cleaning unit (AR cooling, chimney cooling) ・ Baseboard heating unit
・ Compatible with 3 to 6 inch substrates (corresponding to variant substrates such as small and rectangles by tray transport)
■ Sputta Cathode structure
・ A large -diameter wide erotic due to biased spinning magnet achieves a high -precision film thickness and long life of the target.
・ The magnetic field design is designed by us by our company to maximize customer requests.
■ T/S adjustment mechanism
・ Maintain high uniformity of film thickness to the target life by automatically adjusting the T/S distance change due to target erosion.
■ MP Spatta
・ With unique plasma control technology, the DC magnetron patta method (1) high energy of spatta particles (2) high -density of active species (3) Realize migration promotion of particles on the substrate.
・ Film film such as high crystals/high -direction -oriented functions, high -density/high moisture -resistant protection film, low -resistance metal film, etc., which are essential for miniaturization and high performance of electronic components
■ Equipped with a board heating unit
Equipped with a high -temperature heat heater stage (800 ° C) can be used to support high -temperature processes
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Product
Multi -layer film sputtering device S600
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Handling Company
Panasonic Production Engineering Co., Ltd.
1 Models of Multi -layer film sputtering device S600
| Product Image | Part Number | Price (excluding tax) | Number of process modules | Process gas species | Supported board size | Target size |
|---|---|---|---|---|---|---|
|
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S600 |
Available upon quote | 4 Max. 4 bases +1 (optional) | AR, N2, O2 | φ3 inch ~ φ6 inch | φ200, φ250, φ300, φ350mm |
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About Company Handling This Product
Panasonic Production Engineering Co., Ltd.
- Japan
- Since 2014
- 657 employees