Sputter device with full automatic function precious metal coat MSP-20-Um
Vacuum device
About This Product
Magnetron Patta device is applied to promote ionization on the cathode surface layer using a powerful magnet on the back of the target, and apply a metal molecule to collide with a magnetic field by a magnetic field.
Precious metals such as gold and platinum are used mainly for electron microscopes. In addition, we have a lineup of top models that can spat other metal targets.
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Product
Sputter device with full automatic function precious metal coat MSP-20-Um
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Handling Company
Vacuum device
1 Models of Sputter device with full automatic function precious metal coat MSP-20-Um
| Product Image | Part Number | Price (excluding tax) | Achievement vacuum | Advanced voltage/current | Chamber size | Device size | Exhaust system | Introduction of atmosphere gas | Safety measure | Sample size | Sample stage | Target -sample interval | Target metal | power supply | target | timer |
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MSP-20-Um |
Available upon quote | 1 (PA) or less | Voltage DC0 ~ 700V/current DC0 ~ 50mA | Inner diameter 149mmx depth 82mm | Body W350mm x H347mm x D420mm16kg | External RP50ℓ/min15kg | 1/4 'Swageage lock connection, 0.05MPa or less. | Fuses by system, upper lid open sensor | Standard: ≦ φ50mm, height: 25mm tilt / rotation sample when using: (slope) Diameter ≦ φ20mm, height: ≦ 20 m m (flat surface) Diameter: φ50mm, height: ≦ 25 m M | Standard: φ50mm floating method Options: φ50mm with tilted mechanism rotation sample | 40mm | (Thickness 0.1mm) PT (standard), au, au-PD, PT-PD, PD, AG (0.5mm thick) | AC100V, 15A with ground wire 3m used 3m | φ50 M Magnetron method | OMRON's electronic timer |
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