Multi PVD Silam Memorial <Dash Series>
Nanotech
About This Product
It is a device developed for research and development such as improving the adhesion of the DLC membrane, thickening, and composite film by using various steamed diamond -like carbon (DLC) films that have high hardness in low friction coefficient and high -rigidity. In addition, if an arc source or HCD gun is used alone, the coating of the titanium or chrome -based thin film / alloy film is also possible, and the coating of the oxide film is possible by using sputtering or EB gun.
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Product
Multi PVD Silam Memorial <Dash Series>
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Handling Company
Nanotech
3 Models of Multi PVD Silam Memorial <Dash Series>
Items marked with have different values depending on the model number.
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| Product Image | Part Number | Price (excluding tax) | Achievement pressure | Board bias | Board heating mechanism | Board holder | Compressed air | Cooling water | Device control | Effective area (mm) | Exhaust speed | Exhaust system | Installation area (M) | Installed discharge system | Need for power | v |
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Dash-500 |
Available upon quote | 6.7E-4PA or less | MAX3,000V500MA | Options (sheath heaters, lamp heaters, etc.) | Self -open type (custom -made production according to product shape) | 6kgf/cm2 or higher | 3kgf/CM220L -40L/min | Completely automatic driving with recipe screen setting * Excludes some complex types | φ200 × 200L | Within 30 minutes to 6.7E-3PA | Turbo molecular pump + rotary pump | 2.5W x 3.0D x 2.5H | ・ DLC ion source (ionized vapor source), HCD gun, sputtering arc, EB gun, ion injection source | 3φ200V15KVA ~ | 500W x 500W x 600H |
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Dash-800 |
Available upon quote | 6.7E-4PA or less | MAX3,000V500MA | Options (sheath heaters, lamp heaters, etc.) | Self -open type (custom -made production according to product shape) | 6kgf/cm2 or higher | 3kgf/CM220L -40L/min | Completely automatic driving with recipe screen setting * Excludes some complex types | φ500 × 200L | Within 30 minutes to 6.7E-3PA | Turbo molecular pump + rotary pump | 3.0W x 4.0D x 2.5H | ・ DLC ion source (ionized vapor source), HCD gun, sputtering arc, EB gun, ion injection source | 3φ200V25KVA ~ | φ800 × 650H |
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DASH-1000 |
Available upon quote | 6.7E-4PA or less | MAX3,000V500MA | Options (sheath heaters, lamp heaters, etc.) | Self -open type (custom -made production according to product shape) | 6kgf/cm2 or higher | 3kgf/CM220L -40L/min | Completely automatic driving with recipe screen setting * Excludes some complex types | φ600 × 500L | Within 30 minutes to 6.7E-3PA | Turbo molecular pump + rotary pump | 4.0W x 4.0D x 2.5H | ・ DLC ion source (ionized vapor source), HCD gun, sputtering arc, EB gun, ion injection source | 3φ200V30KVA ~ | φ1000 × 900H |
Click on the part number for more information about each product
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