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  4. Thin film forming device multi -buspattting device (SHINKO SEIKI CO., LTD.)

Thin film forming device multi -buspattting device
SHINKO SEIKI CO., LTD.

About This Product

This is the latest sputter ring device that can be flexible regardless of the substrate or application, such as SI wafer, glass and ceramics. The R & D Multi -Bath Pattadling device announced in 1991 has evolved into a full -fledged cluster tool that covers the development and prototypes of advanced devices from the accumulated software and flexible hardware. The STM Series, a crystal of Shinko Seiki's thin film technology, is active in each field, such as semiconductors, FPD, MEMS, and tip surface implementation. Characteristics of the product ･ Weha base plate (φ76.2 -φ203.2mm) can be processed up to 203mm diagonal or ceramic plate. ･ We have various selection functions that can be used for basic research on future processes or various prototype production. ･ The configuration parts are unitized with emphasis on reliability. ･ Each room independent maintenance is possible, along with the simplicity of maintenance, achieving a shortening of maintenance time and rising time. -The space -saving and through wall type support high -level clean room use. * If an etching room is installed, one spatta room will be one room.

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    Thin film forming device multi -buspattting device

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0 Models of Thin film forming device multi -buspattting device

Image Part Number Price (excluding tax) Processing board Equipment configuration / cassette room Equipment configuration / transport room Equipment configuration / etching room Equipment configuration / Sputta room Cathode specification / 1st spatta room Cathode specification / 2nd spatta room Sputta direction Process performance / membrane thickening Process performance / etching distribution Process performance / board heating Each room reaches the power / cassette room Achievement of each room 压 Power / transport room Achievement of each room 压 Power / etching room Achievement of each room 压 Power / Spatta room Method of operation Cathode specification / 3rd spatta room Cathode specification / 4th Spatta Room

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About Company Handling This Product

SHINKO SEIKI CO., LTD.

Company Overview

SHINKO SEIKI CO., LTD., established in 1949, and located in Kobe, Japan, is a manufacturer of vacuum devices, ...

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  • Japan

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