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  2. Semiconductor Manufacturing
  3. Electron Beam Lithography Systems
  4. Electron beam lithography system (variable/spot) JBX-A9 series (JEOL Ltd.)
Electron beam lithography system (variable/spot) JBX-A9 series-JBX-A9
Electron beam lithography system (variable/spot) JBX-A9 series-JEOL Ltd.

Electron beam lithography system (variable/spot) JBX-A9 series
JEOL Ltd.

JEOL Ltd.'s Response Status

Response Rate

100.0%

Response Time

41.9hours

About This Product

■Features

・Both high drawing accuracy and high throughput ・Electron optical system designed for stability ・Supports up to 300 mm wafer ・Available for 300 mm wafer FOUP ・Can be installed in-line with other products such as automatic processors ・Low power consumption compared to our conventional model ・Easy to use that anyone can use

  • Product

    Electron beam lithography system (variable/spot) JBX-A9 series

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1 Models of Electron beam lithography system (variable/spot) JBX-A9 series

Image Part Number Price (excluding tax) Stage position reading resolution Beam current Field size Field joining accuracy Acceleration voltage Aberration correction Maximum material size Minimum increment Minimum line width Standard footprint Power consumption Scanning speed Overlay accuracy
Electron beam lithography system (variable/spot) JBX-A9 series-Part Number-JBX-A9

JBX-A9

Available upon quote

0.15nm

50 pA ~ 400 nA

1,000μm

±9 nm

100 kV

Deflection focus
deflection astigmatism
deflection distortion

300mm wafer
9 inch (inch) mask

0.25nm

≦8 nm

7.4m × 5.3m × 2.7m (H)

Normally 5 kVA

200MHz (max)

±9 nm

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About Company Handling This Product

JEOL Ltd.

Response Rate

100.0%

Response Time

41.9hrs

  • Japan

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Electron Beam Lithography Systems
Electron Beam Lithography Systems　JEOL Ltd.
JEOL Ltd.

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