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  3. Electron Beam Lithography Systems
  4. Electron beam lithography system (variable/spot) JBX-A9 series (JEOL Ltd.)
Electron beam lithography system (variable/spot) JBX-A9 series-JBX-A9
Electron beam lithography system (variable/spot) JBX-A9 series-JEOL Ltd.

Electron beam lithography system (variable/spot) JBX-A9 series
JEOL Ltd.

About This Product

■Features

- Achieves both high drawing accuracy and high throughput - Electronic optical system designed for stability - Supports wafers up to 300 mm - Supports 300 mm wafer FOUP - Can be integrated in-line with other products such as automatic developing machines - Lower power consumption compared to our previous models - Easy operation for anyone to use

  • Product

    Electron beam lithography system (variable/spot) JBX-A9 series

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1 Models of Electron beam lithography system (variable/spot) JBX-A9 series

Image Part Number Price (excluding tax) Stage position reading resolution Beam current Field size Field joining accuracy Acceleration voltage Aberration correction Maximum material size Minimum increment Minimum line width Standard footprint Power consumption Scanning speed Overlay accuracy
Electron beam lithography system (variable/spot) JBX-A9 series-Part Number-JBX-A9

JBX-A9

Available upon quote

0.15nm

50 pA ~ 400 nA

1,000μm

±9 nm

100 kV

Deflection focus
deflection astigmatism
deflection distortion

300mm wafer
9 inch (inch) mask

0.25nm

≦8 nm

7.4m × 5.3m × 2.7m (H)

Normally 5 kVA

200MHz (max)

±9 nm

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JEOL Ltd.

  • Japan

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JEOL Ltd.

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