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  3. Atmospheric pressure plasma device
  4. Attotive pressure (remote) Low-temperature pen type air pressure plasma device Barrier-20 (SAKIGAKE-Semiconductor)
Attotive pressure (remote) Low-temperature pen type air pressure plasma device Barrier-20-Barrier-20
Attotive pressure (remote) Low-temperature pen type air pressure plasma device Barrier-20-SAKIGAKE-Semiconductor

Attotive pressure (remote) Low-temperature pen type air pressure plasma device Barrier-20
SAKIGAKE-Semiconductor

SAKIGAKE-Semiconductor's Response Status

Response Rate

100.0%

Response Time

120.0hours

About This Product

Attached plasma processing at lower temperature and lower flow at low flow. Surface modification: In a atmospheric pressure environment, plasma without charge damage is generated stably.

■ Product overview

･ There is almost no damage due to heat. ･ It can be used in various gases such as air, nitrogen, AR, HE. ･ Because it operates with an AC100V outlet, it can be used in various situations. ･ It can also be used as a lab device. ･ Dimensions (including protrusions) (mm) 260 (W) × 280 (d) × 139 (H) ･ Maintenance is also easy. ･ Improvement of wetness (application / adhesive pre -treatment) ･ For surface cleaning such as metal, glass, resin, film, fiber (organic matter removal)

  • Product

    Attotive pressure (remote) Low-temperature pen type air pressure plasma device Barrier-20

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Last viewed: 19 hours ago

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1 Models of Attotive pressure (remote) Low-temperature pen type air pressure plasma device Barrier-20

Image Part Number Price (excluding tax) External dimensions (plasma pen) Output adjustment Gas used Flow rate adjustment power supply function
Attotive pressure (remote) Low-temperature pen type air pressure plasma device Barrier-20-Part Number-Barrier-20

Barrier-20

Available upon quote

φ25mm x 122mm

can be

N2 / AR / HE ・ Air (modification may be required according to gas)

none

100V, 5A (50Hz/60Hz)

Processing time timer

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About Company Handling This Product

SAKIGAKE-Semiconductor

Response Rate

100.0%

Response Time

120.0hrs

Related search keywords

Atmospheric pressure plasma device
Atmospheric pressure plasma device　SAKIGAKE-Semiconductor
SAKIGAKE-Semiconductor

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