All Categories

History

  1. Metoree
  2. Machining / Machine Tools
  3. Plasma-Enhanced CVD
  4. Vacuum direct vaporization type-thin film formation device DH-CVD (SAKIGAKE-Semiconductor)
Vacuum direct vaporization type-thin film formation device DH-CVD-DH-CVD
Vacuum direct vaporization type-thin film formation device DH-CVD-SAKIGAKE-Semiconductor

Vacuum direct vaporization type-thin film formation device DH-CVD
SAKIGAKE-Semiconductor

SAKIGAKE-Semiconductor's Response Status

Response Rate

100.0%

Response Time

120.0hours

About This Product

The industry's first safe plasma CVD that directly forms a film from a liquid raw material.

■ Product overview

･ Thin film formation device that applies the unique “DH-CVD” technology ･ Organic metal materials can be used safely without using dangerous gas ･ Low cost because there is no need for liquid vaporization devices and flow control devices ･ Thin film formation is possible with simple operations ･ Easy to handle raw materials than gas

■ Silamon -produced solution

･ Combination solution 1 SIO2 membrane solution ･ Combination liquid 2 carbon hydrogen membrane/containing element selection solution (Custom compound according to request) ･ 3 metal oxide solution (custom compound according to the request)

  • Product

    Vacuum direct vaporization type-thin film formation device DH-CVD

Share this product


280+ people viewing

Last viewed: 1 hour ago

Free
Get started with our free quotation service - no cost, no obligation.

No Phone Required
We respect your privacy. You can receive quotes without sharing your phone number.

1 Models of Vacuum direct vaporization type-thin film formation device DH-CVD

Image Part Number Price (excluding tax) External dimensions Electrode stage weight Discharge system High -voltage power supply Output adjustment Gas introduction Exhaust flow adjustment adjustment Vacuum gauge timer power supply
Vacuum direct vaporization type-thin film formation device DH-CVD-Part Number-DH-CVD

DH-CVD

Available upon quote

560mm (W) x 560mm (d) x 400mm (H)

Diameter 400mm stainless steel (optional can be changed)

200kg

Exchange parallel flat plate type

Exchange (synchronized with power frequency)

Manual adjustment

none

None (additional as options)

None (additional as options)

Set plasma irradiation time between 0 to 9,999 seconds

Single phase 200V, 15A (50Hz/60Hz)
* Includes pump power supply

Customers who viewed this product also viewed

Reviews shown here are reviews of companies.

Silamon -film -formable three -dimensional three -dimensional material compatible experimental plasma CVD device-DINOVAC

Silamon -film -formable three -dimensional three -dimensional material compatible experimental plasma CVD device

DINOVAC

200+ people viewing

Last viewed: 6 hours ago

Response time: 18.05 hours

Plasma-Enhanced CVD
MP-CVD equipment for diamond synthesis DCVD-301B/601B-Arios Co., Ltd.

MP-CVD equipment for diamond synthesis DCVD-301B/601B

Arios Co., Ltd.

40+ people viewing

Last viewed: 6 hours ago

Response time: 0.88 hours

Plasma-Enhanced CVD

3 models listed

CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma-Microphase Co., Ltd.

CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma

Microphase Co., Ltd.

40+ people viewing

Last viewed: 12 hours ago

Response time: 126.17 hours

Plasma-Enhanced CVD

2 models listed

Plasma CVD experimental equipment PCVD-R100-Arios Co., Ltd.

Plasma CVD experimental equipment PCVD-R100

Arios Co., Ltd.

30+ people viewing

Last viewed: 22 hours ago

Response time: 0.88 hours

Plasma-Enhanced CVD

3 models listed

PET bottle Plasma CVD device Single Bottle DLC Silamon Memorial Manual Loding-Japan Create Co., Ltd.

PET bottle Plasma CVD device Single Bottle DLC Silamon Memorial Manual Loding

Japan Create Co., Ltd.

5.0

500+ people viewing

Last viewed: 5 hours ago

Response time: 185.30 hours

Plasma-Enhanced CVD

2 models listed

PET bottle Plasma CVD device linear type DLC Silamon Silam Memorial Loading Automatic Lording-Japan Create Co., Ltd.

PET bottle Plasma CVD device linear type DLC Silamon Silam Memorial Loading Automatic Lording

Japan Create Co., Ltd.

5.0

360+ people viewing

Response time: 185.30 hours

Plasma-Enhanced CVD

2 models listed

ICPCVD Process Module PlasmaPro 100 ICPCVD-Oxford Instruments Ltd.

ICPCVD Process Module PlasmaPro 100 ICPCVD

Oxford Instruments Ltd.

190+ people viewing

Last viewed: 4 minutes ago

Response time: 26.30 hours

Plasma-Enhanced CVD
Achieving high film formation characteristics of nanomaterials PlasmaPro 100 Nano CVD-Oxford Instruments Ltd.

Achieving high film formation characteristics of nanomaterials PlasmaPro 100 Nano CVD

Oxford Instruments Ltd.

190+ people viewing

Last viewed: 10 minutes ago

Response time: 26.30 hours

Plasma-Enhanced CVD
Plasma CVD system PlasmaPro 100 PECVD-Oxford Instruments Ltd.

Plasma CVD system PlasmaPro 100 PECVD

Oxford Instruments Ltd.

180+ people viewing

Last viewed: 10 minutes ago

Response time: 26.30 hours

Plasma-Enhanced CVD
Compact and versatile etch and deposition solution PlasmaPro 80 PECVD-Oxford Instruments Ltd.

Compact and versatile etch and deposition solution PlasmaPro 80 PECVD

Oxford Instruments Ltd.

210+ people viewing

Last viewed: 6 hours ago

Response time: 26.30 hours

Plasma-Enhanced CVD

4 models listed

PlasmaPro 80 RIE provides versatile etch and deposition solutions with an easy-to-use atmospheric charging method-Oxford Instruments Ltd.

PlasmaPro 80 RIE provides versatile etch and deposition solutions with an easy-to-use atmospheric charging method

Oxford Instruments Ltd.

200+ people viewing

Last viewed: 22 hours ago

Response time: 26.30 hours

Plasma-Enhanced CVD

4 models listed

A flexible solution for plasma-enhanced chemical vapor deposition processes PlasmaPro 800 PECVD-Oxford Instruments Ltd.

A flexible solution for plasma-enhanced chemical vapor deposition processes PlasmaPro 800 PECVD

Oxford Instruments Ltd.

210+ people viewing

Response time: 26.30 hours

Plasma-Enhanced CVD

3 models listed

See More Plasma-Enhanced CVD Products

Other products of SAKIGAKE-Semiconductor

Reviews shown here are reviews of companies.

CPE-200ahm with vacuum plasma etcher heating mechanism-SAKIGAKE-Semiconductor

CPE-200ahm with vacuum plasma etcher heating mechanism

SAKIGAKE-Semiconductor

230+ people viewing

Last viewed: 8 hours ago

Response time: 120.00 hours

Plasma Etching Systems

2 models listed

Vacuum Plasma Etcher Semi-Auto Series CPE-S Series-SAKIGAKE-Semiconductor

Vacuum Plasma Etcher Semi-Auto Series CPE-S Series

SAKIGAKE-Semiconductor

230+ people viewing

Last viewed: 9 hours ago

Response time: 120.00 hours

Plasma Etching Systems
Vacuum desktop water-repellent device YHS-ω-SAKIGAKE-Semiconductor

Vacuum desktop water-repellent device YHS-ω

SAKIGAKE-Semiconductor

170+ people viewing

Response time: 120.00 hours

Vacuum Plasma Etcher CPE Series-SAKIGAKE-Semiconductor

Vacuum Plasma Etcher CPE Series

SAKIGAKE-Semiconductor

240+ people viewing

Last viewed: 19 hours ago

Response time: 120.00 hours

Plasma Etching Systems

2 models listed

Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G-SAKIGAKE-Semiconductor

Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G

SAKIGAKE-Semiconductor

310+ people viewing

Last viewed: 6 hours ago

Response time: 120.00 hours

Plasma Cleaning Systems
Vacuum tabletop vacuum plasma device YHS-R-SAKIGAKE-Semiconductor

Vacuum tabletop vacuum plasma device YHS-R

SAKIGAKE-Semiconductor

290+ people viewing

Last viewed: 5 hours ago

Response time: 120.00 hours

Plasma Cleaning Systems
Vacuum and small vacuum plasma device NMR-GTS-SAKIGAKE-Semiconductor

Vacuum and small vacuum plasma device NMR-GTS

SAKIGAKE-Semiconductor

270+ people viewing

Last viewed: 5 hours ago

Response time: 120.00 hours

Plasma Cleaning Systems
Vacuum water repellency CFC-550-SAKIGAKE-Semiconductor

Vacuum water repellency CFC-550

SAKIGAKE-Semiconductor

210+ people viewing

Response time: 120.00 hours

Coating Machines
Vacuum Plasma Etcher CPE-B series-SAKIGAKE-Semiconductor

Vacuum Plasma Etcher CPE-B series

SAKIGAKE-Semiconductor

230+ people viewing

Last viewed: 1 hour ago

Response time: 120.00 hours

Plasma Etching Systems

2 models listed

Attotive pressure (direct) Attotive pressure liquid powder plasma processing device full-scale research PPU-800-SAKIGAKE-Semiconductor

Attotive pressure (direct) Attotive pressure liquid powder plasma processing device full-scale research PPU-800

SAKIGAKE-Semiconductor

200+ people viewing

Last viewed: 22 hours ago

Response time: 120.00 hours

Atmospheric pressure plasma device
High-frequency power supply vacuum plasma device US-80A-SAKIGAKE-Semiconductor

High-frequency power supply vacuum plasma device US-80A

SAKIGAKE-Semiconductor

260+ people viewing

Last viewed: 9 hours ago

Response time: 120.00 hours

Plasma Cleaning Systems
Attotive pressure (direct) Attotive pressure liquid powder plasma processing device ASS-400-SAKIGAKE-Semiconductor

Attotive pressure (direct) Attotive pressure liquid powder plasma processing device ASS-400

SAKIGAKE-Semiconductor

270+ people viewing

Response time: 120.00 hours

Atmospheric pressure plasma device

View more products of SAKIGAKE-Semiconductor

About Company Handling This Product

SAKIGAKE-Semiconductor

Response Rate

100.0%

Response Time

120.0hrs

Related search keywords

Plasma-Enhanced CVD
Plasma-Enhanced CVD　SAKIGAKE-Semiconductor
SAKIGAKE-Semiconductor

This is the version of our website addressed to speakers of English in the United States. If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.

Copyright © 2024 Metoree