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Sputtering device for thin film formation equipment research and development-SRV3100
Sputtering device for thin film formation equipment research and development-SRV4320
Sputtering device for thin film formation equipment research and development-SHINKO SEIKI CO., LTD.

Sputtering device for thin film formation equipment research and development
SHINKO SEIKI CO., LTD.


About This Product

It is a compact hard configuration that is ideal for experiments and basic research. We provide low -cost and reliable hardware. Road lock type equipment specification ・ SRL3320 parallel flat plate type ・ SDL4320 parallel flat plate type ・ STL5520 Parallel flat plate type Batch type equipment specification ・ SRV3100 parallel flat plate type ・ SRV3300 Parallel flat plate type ・ SRV4320 parallel flat plate type

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    Sputtering device for thin film formation equipment research and development

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6 Models of Sputtering device for thin film formation equipment research and development

Click on the part number for more information about each product

Image Part Number Price (excluding tax) Processing board Target / Cathode type Target / Size x number Sputta direction Base platform / rotation mechanism Base board / substrate heating Base platform / membrane thick distribution Base board / transport method Exhaust system / Achievement power Exhaust system / exhaust time Exhaust system / main pump Operation method / exhaust operation Operation method / Transportation operation Operation method / film formation operation Sputta power supply / RF Spatta power supply / DC Gas introduction system

SRL3320

Available upon quote

¢ 180mm x 1 sheet

Plena magnetron

¢ 75m x 3

up

300 ° C on the board stand

Within ± 5%(¢ 50)

Transfer rod

8.0 x 10-⁵ PA or less

5.0 x 10-⁴ PA within 25 minutes

Turbo molecular pump

Automatic

Manual

Half -automatic (timer type)

500W

option

Two systems

SDL4320

Available upon quote

¢ 200mm x 1 sheet

Plena magnetron

¢ 100mm x 3

up

300 ° C on the board stand

Within ± 10%(¢ 180)

Transfer rod

8.0 x 10-⁵ PA or less

5.0 x 10-⁴ PA within 20 minutes

Turbo molecular pump

Automatic

Manual

Half -automatic (timer type)

option

3kw

Two systems

STL5520

Available upon quote

¢ 200mm x 1 sheet

Plena magnetron

¢ 75m x 5

up

700 ° C on the board stand

Within ± 10%(¢ 200)

Multi -stage rod

8.0 x 10-⁵ PA or less

5.0 x 10-⁴ PA within 20 minutes

Turbo molecular pump

Automatic

Automatic

Automatic

500W

3kw

Two systems

Sputtering device for thin film formation equipment research and development-Part Number-SRV3100

SRV3100

Available upon quote

¢ 100mm

Plena magnetron

¢ 75m x 1

up

-

200 ° C on the board stand

Within ± 10%(¢ 50)

-

5.0 x 10-⁴ PA or less

9.9 X 10-⁴ PA within 20 minutes

Oil diffusion pump

Manual

-

Manual (timer type)

500W

option

One system

Sputtering device for thin film formation equipment research and development-Part Number-SRV3300

SRV3300

Available upon quote

¢ 190mm

Plena magnetron

¢ 75m x 3

down

300 ° C on the board stand

Within ± 5%(¢ 180)

-

5.0 x 10-⁴ PA or less

9.9 X 10-⁴ PA within 20 minutes

Oil diffusion pump

Manual

-

Manual (timer type)

500W

option

Two systems

Sputtering device for thin film formation equipment research and development-Part Number-SRV4320

SRV4320

Available upon quote

¢ 280mm

Plena magnetron

¢ 100mm x 3

up

300 ° C on the board stand

Within ± 5%(¢ 200)

-

5.0 x 10-⁴ PA or less

9.9 X 10-⁴ PA within 20 minutes

Turboquet pump

Manual

-

Manual (timer type)

1kw

option

Two systems

Click on the part number for more information about each product

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About Company Handling This Product

Company Overview

SHINKO SEIKI CO., LTD., established in 1949, and located in Kobe, Japan, is a manufacturer of vacuum devices, ...

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  • Japan

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