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  4. Thin film forming device super high vacuum sputter ring device (SHINKO SEIKI CO., LTD.)

Thin film forming device super high vacuum sputter ring device
SHINKO SEIKI CO., LTD.

About This Product

It is an ultra -high vacuum compatible sputtering device with a 10 -PA background exhaust performance in the spatta room. It consists of 6 rooms in the road rock room, cassette room, transport room, and sputter room, and can be used in a multilayer film in ultra -high and air. It is extremely effective for developing magnetic devices and compounds. 【feature】 ･ For research and development of state -of -the -art devices such as magnetic devices, nitride, and oxide semiconductors ･ The latest multi -chamber system compatible with up to φ8 inchwayha

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    Thin film forming device super high vacuum sputter ring device

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0 Models of Thin film forming device super high vacuum sputter ring device

Image Part Number Price (excluding tax) Processing board Equipment configuration / road rock room Equipment configuration / cassette room Equipment configuration / transport room Equipment configuration / Sputta room Cathode specifications Sputta direction Process performance / membrane thickening Process performance / etching distribution Process performance / board heating Achievement of each room / Road Lock Room Each room reaches the power / cassette room Achievement of each room 压 Power / transport room Achievement of each room 压 Power / Spatta room Method of operation

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About Company Handling This Product

SHINKO SEIKI CO., LTD.

Company Overview

SHINKO SEIKI CO., LTD., established in 1949, and located in Kobe, Japan, is a manufacturer of vacuum devices, ...

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  • Japan

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