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  4. Thin film formation device wrapping type sputtering device (SHINKO SEIKI CO., LTD.)
Thin film formation device wrapping type sputtering device-SDR series
Thin film formation device wrapping type sputtering device-SHINKO SEIKI CO., LTD.

Thin film formation device wrapping type sputtering device
SHINKO SEIKI CO., LTD.

About This Product

This is the latest RTOR type film model device that realizes not only resin but also metal foil continuous winding processing. Each mechanism, such as cathode, plasma treatment, and heating mechanism, is unitized and supports a wide range of applications. * The base material is compatible with various resin film and metal foil.

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    Thin film formation device wrapping type sputtering device

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1 Models of Thin film formation device wrapping type sputtering device

Image Part Number Price (excluding tax) Base material width Base material thickness Subdivision in the substrate Core outer diameter for substrates Driving speed tension Sputta Cathode Preparatory Organization (optional)
Thin film formation device wrapping type sputtering device-Part Number-SDR series

SDR series

Available upon quote

300-1000 mm

20 ~ 50 µm

Maximum ¢ 300m

6 "(≒ 150 mm)

0.5 ~ 20m / min

5 ~ 50kgf / full width

Up to 4 units

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About Company Handling This Product

SHINKO SEIKI CO., LTD.

Company Overview

SHINKO SEIKI CO., LTD., established in 1949, and located in Kobe, Japan, is a manufacturer of vacuum devices, ...

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  • Japan

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