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Base board / substrate heating
Base platform / membrane thick distribution
Base platform / rotation mechanism
Exhaust system / Achievement power
Exhaust system / exhaust time
Exhaust system / main pump
Gas introduction system
Operation method / exhaust operation
Operation method / film formation operation
Processing board
Spatta power supply / DC
Sputta direction
Sputta power supply / RF
Target / Cathode type
Target / Size x number
Part Number
SRV4310Handling Company
SHINKO SEIKI CO., LTD.Categories
| Image | Price (excluding tax) | Base board / substrate heating | Base platform / membrane thick distribution | Base platform / rotation mechanism | Exhaust system / Achievement power | Exhaust system / exhaust time | Exhaust system / main pump | Gas introduction system | Operation method / exhaust operation | Operation method / film formation operation | Processing board | Spatta power supply / DC | Sputta direction | Sputta power supply / RF | Target / Cathode type | Target / Size x number |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
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Available upon quote | 300 ° C on the board stand | Within ± 10%(¢ 210) | ◯ | 6.0 x 10-⁵ PA or less | 9.9 X 10-⁴ PA within 10 minutes | Cry -pump | Two systems | Automatic | Half -automatic (timer type) | ¢ 320mm | option | up | 500W | Plena magnetron | ¢ 100mm x 3 |
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Reviews shown here are reviews of companies.
