9 Vacuum Vapor Deposition Device Manufacturers in 2024
This section provides an overview for vacuum vapor deposition devices as well as their applications and principles. Also, please take a look at the list of 9 vacuum vapor deposition device manufacturers and their company rankings. Here are the top-ranked vacuum vapor deposition device companies as of November, 2024: 1.ST Instruments B.V, 2.SATO VAC INC., 3.ULVAC, Inc.
Table of Contents
What Is a Vacuum Vapor Deposition Device?
A vacuum vapor deposition device is a device that forms a film on an object by vaporizing a substance under reduced pressure.
A vacuum vapor deposition device can form a smooth coating on an object, and the thickness and composition of the coating can be controlled.
Uses of Vacuum Vapor Deposition Devices
Vacuum vapor deposition devices can form films of various materials, including metallic materials, such as aluminum and organic/inorganic materials.
Vacuum vapor deposition devices are used for the following applications:
- Optical thin films (antireflection coatings for lenses, special mirrors, etc.)
- Magnetic tapes (audio and video tapes, etc.)
- Semiconductors (organic EL, LED, solar cells, etc.)
- Electronic components (resistors, capacitors, semiconductor integrated circuits, etc.)
- Food packaging materials (e.g. aluminum evaporated film used for snack bags, etc.)
- Analytical applications (sample preparations)
Principle of Vacuum Vapor Deposition Devices
A rotary pump or turbomolecular pump is used to depressurize the chamber, vaporize the material to be deposited, and deposit it on the object at a distance. The reduced pressure removes impurities from the chamber and improves the diffusion of the vaporized material to produce a smooth film with good adhesion.
Plating is a well-known method of forming a film on the surface of a material. The difference is in plating, raw materials are supplied from the liquid phase, whereas in vapor deposition, raw materials are supplied from the gas phase.
Types of Vacuum Vapor Deposition Devices
Deposition methods used in vacuum vapor deposition devices can be divided into two types according to the method used to vaporize the substance: physical vapor deposition (PVD) and chemical vapor deposition (CVD).
1. Physical Vapor Deposition (PVD)
Physical vapor deposition (PVD) is a method of forming films by vaporizing or sublimating evaporation materials through physical means, such as heating. Heating methods include electron beam, resistance heating, high-frequency induction, and laser.
- Electron Beam Heating
Vaporization is caused by irradiating the evaporation material stored in a crucible made of refractory materials with an electron beam. Electron beams have high energy and can be applied to materials with high melting points. - Resistance Heating
An electric current is applied to a resistor such as tungsten to generate heat, and the evaporation material is placed on the resistor to heat and vaporize the evaporation material. Since it is relatively difficult to raise the temperature, this method is suitable for materials with low melting points. - High-frequency Induction Heating
The evaporation material is placed in a crucible with a coil wound around it, and a high-frequency current is passed through the coil to generate a strong magnetic field. The current generated by the magnetic field and the heat generated by the electric heat resistance rapidly raise the temperature to vaporize the film material. - Laser Heating
By irradiating the deposition material with a laser, high energy is supplied to vaporize the deposition material.
Plasma and molecular beam methods are also used as physical vapor deposition methods.
- Molecular Beam Epitaxy (MBE)
This method uses vacuum deposition in an ultra-high vacuum to align the vaporized molecules in the same direction, allowing for more precise control of film thickness and composition. The growth rate is slow and requires a high vacuum, making it unsuitable for larger equipment and poor for mass production. - Sputtering
When an inert gas, such as argon, is injected into a vacuum and a voltage is applied to the electrode to cause a glow discharge, the plasmaized argon collides with the cathode, repelling atoms and molecules on the cathode. If the object to be deposited is placed on the anode, the repelled atoms are deposited on the surface. Ionization methods include direct current voltage (DC), radio frequency alternating current voltage (RF-AC), magnetrons, and ion beams.
2. Chemical Vapor Deposition (CVD)
Chemical vapor deposition (CVD) is a method of forming films by depositing evaporation materials on an object using chemical reactions or other chemical methods. Typical methods include thermal CVD, optical CVD, plasma CVD, organometallic CVD, and atomic layer deposition (ALD).
- Thermal CVD
This method uses a resistively heated furnace to create high temperatures, through which raw material gases flow to induce chemical reactions to form thin films. Relatively uniform film thickness can be achieved. - Optical CVD
This method uses ultraviolet lamps or laser beams to cause chemical reactions in a low-temperature process to form thin films. Since no ions are generated, there is little damage to the substrate. - Plasma CVD
Plasma CVD is a method in which the reactivity of raw materials is increased by plasticizing them, causing a reaction to the evaporation target to form a film. High-quality films can be formed because thin films are formed at low temperatures. However, the equipment is expensive and maintenance is difficult. - Organometallic CVD
This method uses an organometallic precursor of the metal to be vapor-deposited as a raw material, which reacts on the target to form a metallic thin film. This method is used for the mass production of LEDs and other devices because it can form films at high speed while precisely controlling film thickness. - Atomic Layer Deposition (ALD)
By depositing and replacing multiple types of raw materials one at a time, the materials react in a controlled manner at a fixed location to form a thin film with a controlled structure and thickness.
In addition to the above, vacuum vapor deposition devices of various methods have been developed and are sold. It is necessary to select the appropriate equipment according to the application.
List of 9 Vacuum Vapor Deposition Device Manufacturers
*Including some distributors, etc.
Sort by Features
- Default
- Company Size: largest first
- Year Founded: oldest first
- Year Founded: earliest first
Sort by Area
- Japan
- Netherlands
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SATO VAC INC.
Vacuum Evaporating Equipment
Manufacturer Overview
SATO VAC INC., established in 1932 and based in Tokyo, Japan, is a manufacturer of vacuum equipment including vacuum pumps, measuring instruments, and parts & components. Its production line is segmented into vacuum pumps, gauges, and equipment used in space development, semiconductors, energy, medical, optics, and automobile industries. The company's vacuum equipment includes compact CVD systems, vacuum defoamers, heat treatment furnaces, dryers, and evaporation systems. The company's production process involves structural designing, prototype creation, design review, and performance testing.
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SHINKO SEIKI CO., LTD.
Horizontal vapor deposition system
Manufacturer Overview
SHINKO SEIKI CO., LTD., established in 1949, and located in Kobe, Japan, is a manufacturer of vacuum devices, electric furnaces and semiconductor manufacturing equipment. Its product line includes a vast array of vacuum pumps such as mechanical booster pumps, vacuum exhaust unit, oil sealed rotary vacuum pumps and water ring vacuum pumps. Its product range also inlcudes soldering equipments, optical inspection equipments, thin film forming equipments, and plasma processing equipments. The company holds several certification for its operation such as the ISO 14004, and the ISO 9001.
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ULVAC KIKO, Inc.
VPC-061
Manufacturer Overview
ULVAC KIKO, Inc., established in 1971 and headquartered in Miyazaki, Japan, is a manufacturer specializing in vacuum pumps and deposition systems. Its product portfolio encompasses oil-sealed rotary vacuum pumps, diaphragm type dry vacuum pumps, rocking piston type dry vacuum pumps, sliding vane type dry vacuum pumps, and high vacuum pumping systems. These products are vital for creating vacuum environments in industries like semiconductor manufacturing and flat panel display production. The company is known for its adherence to quality, holding ISO 9001 certification since 1997 and ISO 14001 certification since 2001.
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ULVAC, Inc
Vacuum Evaporation System
Manufacturer Overview
Ulvac Inc., established in 1952 and headquartered in Kanagawa, Japan, is a manufacturer of vacuum equipment, components, peripheral devices, and materials for the solar cell and semiconductor industries, among others. The company operates businesses in six areas, including materials, components, electronic devices, semiconductors, and flat panel display production equipment. Some of its products include roll coaters, semiconductor production equipment, LED production equipment, leak detectors, and vacuum brazing furnaces. It is ISO9001 certified, and its net sales in the 2022 fiscal year were 227.5 billion Japanese Yen, with 34% of this amount coming from semiconductor and electronic device production equipment.
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PREMATEC Corporation
Vacuum Deposition Equipment
Manufacturer Overview
PREMATEC Corporation, established in 1962, is a manufacturer of equipment used in the production of LCDs based in Nagano, Japan. The company's product portfolio includes bonding, dispensing, slit coater, ambient lamination, and other related equipment. These products are critical in the manufacturing processes of flat panel displays, including LCDs. Additionally, the company is involved in designing and manufacturing special-purpose equipment. These machines are tailored for specific industrial applications. The company serves electronics manufacturers, OEMs, and industrial equipment manufacturers.
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Microphase Co., Ltd.
Vacuum Vapor Deposition Apparatus for Coating Metal Films on Powder Sample
Manufacturer Overview
Microphase Co. Ltd., established in 1999 and headquartered in Ibaraki, Japan, is a manufacturer of nanotechnology products and energy device innovations. The company's products include high-dispersion CNT, long-length CNT, and various Carbon nanotubes (CNT) applications for energy storage and semiconductor devices. It offers sophisticated equipment like desk-top CVD systems for CNT synthesis and multi-purpose CVD Systems. It also provides specialized nanomaterial synthesis and analysis equipment in nanotechnology, energy, and environmental sectors.
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SHOWA SHINKU CO., LTD.
Vacuum Vapor Deposition Equipment SEC-06D
Manufacturer Overview
Showa Shinku Co. Ltd., founded in 1953 and headquartered in Tokyo, Japan, is a manufacturer of vacuum equipment and components for quartz devices, optical thin films, and more. Its product line features vacuum evaporation equipment, sputtering equipment, ion plating equipment, atomic layer deposition equipment, and dry etching and ashing equipment. These products are integral to various manufacturing processes, particularly in the production of quartz devices, which hold significant importance in industrial applications.
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Vacuum Vapor Deposition Device Manufacturer Ranking
*Including some distributors, etc.Ranking as of November 2024
Derivation Method| Rank | Company | Click Share |
|---|---|---|
| 1 | ST Instruments B.V |
25.6%
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| 2 | SATO VAC INC. |
14.0%
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| 3 | ULVAC, Inc |
14.0%
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| 4 | PREMATEC Corporation |
9.3%
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| 5 | Microphase Co., Ltd. |
9.3%
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| 6 | ULVAC KIKO, Inc. |
9.3%
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| 7 | SHINKO SEIKI CO., LTD. |
9.3%
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| 8 | SHOWA SHINKU CO., LTD. |
7.0%
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| 9 | Japan Create Co., Ltd. |
2.3%
|
Derivation Method
The ranking is calculated based on the click share within the vacuum vapor deposition device page as of November 2024. Click share is defined as the total number of clicks for all companies during the period divided by the number of clicks for each company.Number of Employees
- ULVAC, Inc: 6,235
- SHOWA SHINKU CO., LTD.: 195
- Japan Create Co., Ltd.: 40
Newly Established Company
- Microphase Co., Ltd.: 1999 (25 years ago)
- Japan Create Co., Ltd.: 1963 (61 years ago)
- SHOWA SHINKU CO., LTD.: 1953 (71 years ago)
Company with a History
- SATO VAC INC.: 1932 (92 years ago)
- SHINKO SEIKI CO., LTD.: 1949 (75 years ago)
- PREMATEC Corporation: 1951 (73 years ago)
Global Distribution of Vacuum Vapor Deposition Device Manufacturers by Country
*Including some distributors, etc.
| Country | Number of Companies | Share (%) |
|---|---|---|
Japan
|
8 | 88.9% |
Netherlands
|
1 | 11.1% |
List of Vacuum Vapor Deposition Device Products
22 products are listed.
SHINKO SEIKI CO., LTD.
Thin film forming device large resin substrate vapor package device
50+ people viewing
It is a large vapor advertisement that corresponds to the film for decorating the exterior of the car. It is possible to vapor a resin substrate at...
SHINKO SEIKI CO., LTD.
Vapulator for research and development of thin film formation equipment
100+ people viewing
Last viewed: 11 hours ago
It is a low -cost small vapor equipment that supports basic research experiments. Various aspects such as evaporation mechanism, substrate heating,...
Vacuum device
Vacuum Vacuum Vacuum Dewta TMP Exhaust / Clean Pure Vacuum VE-2030
40+ people viewing
A vacuum vapor is a device that evaporates the material in a vacuum atmosphere and a thin film film on the sample. It is common to form a film in a...
SHINKO SEIKI CO., LTD.
Thin film forming device horizontal vapor adhesion device
60+ people viewing
Ideal for production of small electronic components such as the end of the resistor, the electrode formation of the crystal vibration. A large amou...
Vacuum device
Vacuum vaporization device Small desktop high vacuum vapor sequence device VE -2013
40+ people viewing
A vacuum vapor is a device that evaporates the material in a vacuum atmosphere and a thin film film on the sample. It is common to form a film in a...
SHINKO SEIKI CO., LTD.
Thin film formation device standard type vaporization device
100+ people viewing
Last viewed: 15 hours ago
It is a bestseller type that boasts a wealth of track record in the production process of individual semiconductors and compound semiconductors. Ab...
SHINKO SEIKI CO., LTD.
Thin film formation device lift off process compatible vapor package device
40+ people viewing
This is a dedicated vapor equipment that supports the expanded lift off process. The verticality of high evaporation particles and the adoption of ...
Japan Create Co., Ltd.
Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation
40+ people viewing
■ Characteristics ・ Ideal for single crystal film by epitaxial promotion mechanism ・ Oxidation promotion gas introduction mechanism ・ Material o...
SHINKO SEIKI CO., LTD.
Thin film forming device Road lock type vapor package device
40+ people viewing
Special specification for electronic devices. Specializes in special processes and devices, and is flexible regardless of the substrate shape or pr...
Japan Create Co., Ltd.
Multi Chamber Specifications for OLED for OLED
30+ people viewing
■ Overview It is a multi -chamber specification device that is ideal for device development and material development. It is possible to process the...
