10 Semiconductor Lithography Equipment Manufacturers in 2024
This section provides an overview for semiconductor lithography equipment as well as their applications and principles. Also, please take a look at the list of 10 semiconductor lithography equipment manufacturers and their company rankings. Here are the top-ranked semiconductor lithography equipment companies as of April, 2024: 1.Finisar, 2.INTEGRATED DYNAMICS ENGINEERING GmbH, 3.ASML Holding N.V..
Table of Contents
Categories Related to Semiconductor Lithography Equipment
Department of Chemistry, Graduate School of Science, Tohoku University (Master of Science)
As a display engineer, engaged in Seiko Epson Corporation, Sony Corporation, Japan Display Corporation, etc.
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What Is Semiconductor Lithography Equipment?
Semiconductor Lithography Equipment is used to depict circuit patterns on silicon wafers in the semiconductor manufacturing process. A powerful ultraviolet light is transmitted through a photomask, which serves as a prototype for the circuit pattern, and the circuit pattern is transferred onto a silicon wafer coated with photoresist. In recent years, some equipment uses a laser with a wavelength of 13 nm, called EUV, to miniaturize fine circuit patterns. Since extremely high precision is required for positioning, etc., the equipment is expensive.
Applications of Semiconductor Lithography Equipment
Semiconductor Lithography Equipment is used in the exposure process of manufacturing integrated circuits (ICs), which include semiconductor devices such as MOS (metal oxide semiconductor)-FETs (field effect transistors).
In the IC manufacturing process, photolithography and etching cycles are repeated sequentially on a silicon wafer to stack and process layers (layers) of silicon oxides and metals in a predetermined pattern, which are processed to have the characteristics required for semiconductor devices. In the case of n-type MOS (NMOS), for example, an n-type (n+ type) MOS is formed by forming a silicon oxide film in the gate region on a p-type silicon substrate and a gate metal on top of it, and ion implanting high concentration impurities in the drain and source regions. Each of the photolithography and etching steps in this series of processes is configured as shown in the figure (film deposition process S1~resist stripping process S6).
Of these, the exposure process (S3) is the process performed using Semiconductor Lithography Equipment. Different wavelengths of exposure equipment are used depending on the dimensions of the circuit pattern and the accuracy of the Semiconductor Lithography Equipment.
Principle of Semiconductor Lithography Equipment
Semiconductor Lithography Equipment consists of a light source, condenser lens, photomask, projection lens, and stage. Ultraviolet light generated from the light source is adjusted by the condenser lens so that they face the same direction. The ultraviolet light then passes through a photomask, which serves as a prototype for one layer of the circuit pattern, and the light is reduced by the projection lens to transfer the circuit pattern (one layer of the circuit pattern) of the semiconductor device onto the silicon wafer. In an exposure system such as a stepper, once the transcription is completed, the silicon wafer is moved by the stage and the same circuit pattern is transferred to another position on the silicon wafer. By replacing the photomask, another layer of the circuit pattern of the semiconductor device can be transferred.
KrF excimer lasers with a wavelength of 248 nm, ArF excimer lasers with a wavelength of 193 nm, and EUV light sources with a wavelength of 13 nm are used as light sources.
The design rule (minimum processing dimension) for the latest semiconductor manufacturing process has been miniaturized to 3 to 5 nm, so high precision on the nanometer scale is required for all condenser lenses, photomasks, projection lenses, and stages. Also, because of the progress of stacking, exposure is performed several times before a single semiconductor is produced by changing the circuit pattern.
Semiconductor Lithography Equipment Market Size and Share
The global electronics market continues to expand, and the semiconductor industry is becoming increasingly important in supporting this expansion. The global semiconductor market experienced negative growth in 2019, but has continued to expand in the past despite experiencing the Lehman Shock and other problems. In recent years, memory technology development has shifted from miniaturization to 3D, and etching technology has become more important.
The Semiconductor Lithography Equipment market size is 1.852 trillion yen as of 2018.
The market share by consumption region is as follows: 1st South Korea 36%, 2nd Taiwan 19%, 3rd China 18%, 4th US 14%, and 5th Japan 7%. Semiconductor Lithography Equipment vendor share by nationality (2018) is almost oligopolized by Europe and Japan, with Europe (84%), Japan (14%), and the United States (2%).
About EUV Lithography Equipment
EUV (Extreme Ultraviolet) Lithography Equipment is Semiconductor Lithography Equipment that uses extremely short wavelength light called Extreme Ultraviolet Light. It enables processing of finer dimensions that are difficult to process with conventional exposure systems using ArF excimer laser light.
Semiconductor manufacturing has been progressively miniaturized in accordance with Moore's Law (semiconductor integrated circuits become four times more highly integrated and functional in three years). The development of reduced projection exposure technology called steppers, shorter exposure wavelengths, and immersion exposure technology has dramatically improved resolution.
Miniaturization means that the minimum process size that can be burned onto a wafer becomes smaller, and the minimum process size R is expressed by the following Rayleigh's formula.
R = k/λ/NA *k is a proportionality constant, λ is the exposure wavelength, and N.A. is the numerical aperture of the exposure optical system.
Various technological developments have enabled miniaturization by making k smaller, λ smaller, and NA larger.
EUV lithography systems are considered to be a technology that can break through the limitations of the past by shortening the exposure wavelength, and they have been mass-produced in recent years.
Prices of Semiconductor Lithography Equipment
Semiconductor Lithography Equipment is indispensable for the efficient mass production of semiconductors.
The shorter the wavelength of the light source used in Semiconductor Lithography Equipment, the finer the pattern can be formed and the more expensive the exposure equipment becomes. For each wavelength, i-line lithography costs about 400 million yen, KrF about 1.3 billion yen, ArF dry about 2 billion yen, ArF immersion about 6 billion yen, and EUV about 20 billion yen.
The finer the circuit, the faster the signal transmission and the more energy efficient it can be, but in recent years, the increase in process cost due to miniaturization, including the price of Semiconductor Lithography Equipment, has become impossible to ignore.
In addition, the throughput of Semiconductor Lithography Equipment is also an important indicator of the required performance from the standpoint of semiconductor manufacturing costs. Throughput is a performance indicator of how fast a circuit pattern can be exposed, and as throughput increases, the production cost (running cost) per silicon die decreases. It is considered important during the mass production of semiconductor chips.
List of 10 Semiconductor Lithography Equipment Manufacturers
*Including some distributors, etc.
Sort by Features
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- Company Size: largest first
- Year Founded: oldest first
- Year Founded: earliest first
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- United States of America
- Austria
- Germany
- Japan
- Netherlands
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Manufacturer Overview
Finisar Corporation is a manufacturer of optical communication components and subsystems. The company was founded in April 1987 and situated at Sunnyvale, California. The company is a global technology company in optical communications. Its products enable high-speed voice, video, and data communications for networking, storage, wireless, and cable TV applications. The company has created solutions in optics technology and supplied system manufacturers with production volume for network bandwidth. The company develops a product line primarily for telecommunications, using EY-amplification technologies including erbium-doped fiber amplification, Raman amplification, and dynamic hybrid amplification.
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Ushio Inc.
Large field stepper
Manufacturer Overview
Ushio Inc., established in 1964 in Tokyo, Japan, is a manufacturer and supplier of specialized light sources, with a particular interest in ultraviolet (UV) and visible light. The company boasts an extensive product portfolio that includes various lighting solutions, including laser diodes, UV lamps, visible lights, lamps designed for projectors, and halogen lamps. These diverse products cater to a wide array of industries and applications, including architecture and landscape illumination, disinfection and deodorizing, litho-patterning, optical systems, as well as curing and bonding processes.
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NIHON DEMPA KOGYO CO., LTD.
Semiconductor Lithography Equipment
Manufacturer Overview
NIHON DEMPA KOGYO CO., LTD., founded in 1948, is a Japanese manufacturer and supplier headquartered in Shibuya-ku, Tokyo, specializing in crystal-related products. The company’s product line includes crystal units and oscillators, synthetic quartz crystals, quartz crystal microbalance (QCM) sensors, and millimeter-wave converters. Additionally, the company provides frequency synthesizers, optical components, outgas analysis systems, signal generators, and ultrasound probe (transducers). These products cater to sectors like automotive, healthcare, household appliances, industrial equipment, and medical. Notably, its collaboration with the Japan Aerospace Exploration Agency (JAXA) resulted in the QCM Thermogravimetric Gas Analysis (QTGA) system for analyzing outgas emissions from organic materials in vacuum settings.
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ASML Holding N.V.
EUV lithography systems
Manufacturer Overview
ASML Holding N.V., established in 1984, is an ISO 9001:2015 certified manufacturer of lithography systems that are critical to the production of microchips, including EUV and DUV lithography systems, refurbished PAS 5500, and TWINSCAN systems, used in the medical and electronics industries. With its headquarters in Veldhoven, Netherlands, the company has other locations in the US, Asia, and Europe. The company offers relocation services, training services, customerNet portal for tailored information, and 24-hour delivery time.
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Nikon Corporation
Semiconductor Lithography Systems
Manufacturer Overview
NIKON CORPORATION was founded in Japan in 1917 and is a global manufacturer of imaging products, optics, precision equipment, and instruments. The company's main product offerings include the Nikon Z series of mirrorless cameras, digital SLR cameras, and COOLPIX. It also offers consumer and professional accessories such as NIKKOR brand optics, Speedlights, system accessories, and software products, along with premium sports and recreational optical products, including full-line binoculars, Fieldscopes, and rangefinders. The company complies with international standards such as ISO 14001:2015 and ISO 45001:2018, catering to industries such as photography and videography, healthcare, manufacturing, and research.
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Kyodo International, Inc.
Microfabrication Equipment
Company Overview
Kyodo International, Inc. established in 1970 and based in Kawasaki-shi, Japan, is a manufacturer and distributor of microfabrication tools and equipment. The company's product range includes deposition tools, photolithography equipment, etching machines, CMP processing units, and nanoimprinting tools. These products are used for the development and manufacturing of electronic components and systems. The company serves industries such as electronics manufacturing, microelectromechanical systems (MEMS) production, and life sciences, it ensures the delivery of high-precision tools for intricate manufacturing processes. Its services span the sale, repair, and overhaul of consumable parts.
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EV Group
lithography
Company Overview
EV Group (EVG), established in 1980 in Austria, is a supplier of high-volume production equipment and process solutions for semiconductor, MEMS, compound semiconductor, power device, and nanotechnology device manufacturing. Its product range includes lithography systems, bonding systems, nanoimprint lithography (NIL) equipment, metrology systems, and photoresist coaters, vital in semiconductor manufacturing. The company have earned numerous accolades, including the 3D InCites Award, 2023 ISES Equipment Manufacturer of the Year Award, and known as one of the suppliers of fab equipment to foundation chip makers, emphasizing its excellence in the industry.
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S-Cubed, Inc
Semiconductor Lithography Equipment
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Semiconductor Lithography Equipment Manufacturer Ranking
*Including some distributors, etc.Ranking as of April 2024
Derivation Method| Rank | Company | Click Share |
|---|---|---|
| 1 | Finisar |
41.5%
|
| 2 | INTEGRATED DYNAMICS ENGINEERING GmbH |
14.1%
|
| 3 | ASML Holding N.V. |
8.8%
|
| 4 | S-Cubed, Inc |
7.7%
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| 5 | EV Group |
7.2%
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| 6 | Ushio Inc. |
5.3%
|
| 7 | NIHON DEMPA KOGYO CO., LTD. |
5.1%
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| 8 | Nikon Corporation |
3.7%
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| 9 | Kyodo International, Inc. |
3.6%
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| 10 | Mikasa Co., Ltd |
2.9%
|
Derivation Method
The ranking is calculated based on the click share within the semiconductor lithography equipment page as of April 2024. Click share is defined as the total number of clicks for all companies during the period divided by the number of clicks for each company.Number of Employees
- ASML Holding N.V.: 39,086
- Finisar: 28,000
- Nikon Corporation: 18,437
Newly Established Company
- INTEGRATED DYNAMICS ENGINEERING GmbH: 1990 (34 years ago)
- ASML Holding N.V.: 1984 (40 years ago)
- Kyodo International, Inc.: 1970 (54 years ago)
Company with a History
- Nikon Corporation: 1917 (107 years ago)
- Mikasa Co., Ltd: 1921 (103 years ago)
- NIHON DEMPA KOGYO CO., LTD.: 1948 (76 years ago)
Semiconductor Lithography Equipment Manufacturers in United States
*Including some distributors, etc.
Global Distribution of Semiconductor Lithography Equipment Manufacturers by Country
*Including some distributors, etc.
| Country | Number of Companies | Share (%) |
|---|---|---|
Japan
|
5 | 55.6% |
United States of America
|
1 | 11.1% |
Netherlands
|
1 | 11.1% |
Austria
|
1 | 11.1% |
Germany
|
1 | 11.1% |
