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Plasma cleaning device POEM-Plasma cleaning device POEM
Plasma cleaning device POEM-SHINKO SEIKI CO., LTD.

Plasma cleaning device POEM
SHINKO SEIKI CO., LTD.


About This Product

A plasma surface treatment device that uses a parasma of a parallel flat plate type RIE method that enables treatment such as cleaning, reduction, and oxidation of the substrate surface. By changing the processing mode and processing gas, it supports a wide range of applications. There are two models: a 450 x 450mm large substrate compatible device and a 250 x 250mm small substrate compatible device according to the board size. Characteristics of the product ・ Large area processing of 8 inches or more is possible with a compact housing ・ Powerful for hydrophilic treatment before implementation and removing organic matter and oxide film ・ Ideal for surface treatment of resin substrate ・ You can select a hard mode with good processing and a soft mode that takes into account the damage to the substrate. Mechanism of surface treatment ・ Ideal for removing organic dirt using Aeon's chemical reaction power ・ Physically removing dirt on the surface using the spatta power of ions ・ Use oxygen ions to uniformly oxidize the substrate (metal) surface. ・ Use hydrogen ions to remove the substrate (metal) surface oxide film

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    Plasma cleaning device POEM

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1 Models of Plasma cleaning device POEM

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Plasma cleaning device POEM-Part Number-Plasma cleaning device POEM

Plasma cleaning device POEM

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Company Overview

SHINKO SEIKI CO., LTD., established in 1949, and located in Kobe, Japan, is a manufacturer of vacuum devices, ...

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