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  4. Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation (Japan Create Co., Ltd.)
Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation-Epitaxial-EB vapor packing device
Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation-Japan Create Co., Ltd.

Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation
Japan Create Co., Ltd.

💻 Electronics & Electrical Use 🧪 Chemical Industry Use

Japan Create Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

185.3hours

Company Review

5.0

About This Product

■ Characteristics

・ Ideal for single crystal film by epitaxial promotion mechanism ・ Oxidation promotion gas introduction mechanism ・ Material oxidation prevention mechanism ・ A high temperature process of up to 900 ° C is possible ・ Realizes excellent membrane thickening and reproducibility by substrate rotation ・ Compatible with high vacuum processes by road lock type ・ Particle reduction by optimal surface treatment

  • Product

    Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation

  • Usage Scenarios

    Electronics & Electrical Use / Chemical Industry Use

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1 Models of Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation

Image Part Number Price (excluding tax) Board size Board heating temperature Steamed material Vacuum exhaust Slamy thickness control Control operation Data logging Transportation of the board option
Epitaxial-Eb Vaporizer Fineness of excellent membrane thickening and reproducibility by substrate rotation-Part Number-Epitaxial-EB vapor packing device

Epitaxial-EB vapor packing device

Available upon quote

Maximum φ12 inch

700 ° C (substrate surface)

Metal or oxide

CP+DP

Crystal type thick sensor

Control: PLC
Operation: Touch panel or PC

External memory or PC

Vacuum transport robot

Bachelor heating 900 ° C (board surface), substrate cooling, substrate bias, substrate rotation, resistant heating steaming (up to 6 units), reaction gas supply unit, etc.

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About Company Handling This Product

Japan Create Co., Ltd.

Response Rate

100.0%

Response Time

185.3hrs

Company Review

5.0
  • Japan

Related search keywords

Vacuum Vapor Deposition Devices
Vacuum Vapor Deposition Devices　Japan Create Co., Ltd.
Japan Create Co., Ltd.

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