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Base board / substrate heating
Base board / transport method
Base platform / membrane thick distribution
Base platform / rotation mechanism
Exhaust system / Achievement power
Exhaust system / exhaust time
Exhaust system / main pump
Gas introduction system
Operation method / Transportation operation
Operation method / exhaust operation
Operation method / film formation operation
Processing board
Spatta power supply / DC
Sputta direction
Sputta power supply / RF
Target / Cathode type
Target / Size x number
Part Number
SRV3100Handling Company
SHINKO SEIKI CO., LTD.Categories
| Image | Price (excluding tax) | Base board / substrate heating | Base platform / membrane thick distribution | Exhaust system / Achievement power | Exhaust system / exhaust time | Exhaust system / main pump | Gas introduction system | Operation method / exhaust operation | Operation method / film formation operation | Processing board | Spatta power supply / DC | Sputta direction | Sputta power supply / RF | Target / Cathode type | Target / Size x number |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
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Available upon quote | 200 ° C on the board stand | Within ± 10%(¢ 50) | 5.0 x 10-⁴ PA or less | 9.9 X 10-⁴ PA within 20 minutes | Oil diffusion pump | One system | Manual | Manual (timer type) | ¢ 100mm | option | up | 500W | Plena magnetron | ¢ 75m x 1 |
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Reviews shown here are reviews of companies.
