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  4. Multi -layer film sputtering device S600 (Panasonic Production Engineering Co., Ltd.)
Multi -layer film sputtering device S600-S600
Multi -layer film sputtering device S600-Panasonic Production Engineering Co., Ltd.

Multi -layer film sputtering device S600
Panasonic Production Engineering Co., Ltd.

About This Product

■ Features

・ Both a variety of processes and high productivity with up to 5 cathodes ・ Maintenance of long -term hyperchd and uniformity by adjusting T/S distance ・ Improve spatta thin film characteristics with proprietary plasma control (MP spatta) technology ・ High temperature process is possible with a heater stage (800 ° C) ・ It can be used for various applications from development processes to mass production processes

■ Up to 5 cathodes can be mounted

・ Realizes high productivity in the double load lock room ・ Combine a variety of processes and high throughput in a transport form that combines rotary type and multi -chamber type. ・ Various units can be attached to each position ・ DC/RF cathode ・ MP spatta (proprietary technology) ・ Reverse spatta ・ back side spatta ・ AR cleaning unit (AR cooling, chimney cooling) ・ Baseboard heating unit ・ Compatible with 3 to 6 inch substrates (corresponding to variant substrates such as small and rectangles by tray transport)

■ Sputta Cathode structure

・ A large -diameter wide erotic due to biased spinning magnet achieves a high -precision film thickness and long life of the target. ・ The magnetic field design is designed by us by our company to maximize customer requests.

■ T/S adjustment mechanism

・ Maintain high uniformity of film thickness to the target life by automatically adjusting the T/S distance change due to target erosion.

■ MP Spatta

・ With unique plasma control technology, the DC magnetron patta method (1) high energy of spatta particles (2) high -density of active species (3) Realize migration promotion of particles on the substrate. ・ Film film such as high crystals/high -direction -oriented functions, high -density/high moisture -resistant protection film, low -resistance metal film, etc., which are essential for miniaturization and high performance of electronic components

■ Equipped with a board heating unit

Equipped with a high -temperature heat heater stage (800 ° C) can be used to support high -temperature processes

  • Product

    Multi -layer film sputtering device S600

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1 Models of Multi -layer film sputtering device S600

Image Part Number Price (excluding tax) Supported board size Target size Number of process modules Process gas species
Multi -layer film sputtering device S600-Part Number-S600

S600

Available upon quote

φ3 inch ~ φ6 inch

φ200, φ250, φ300, φ350mm

4 Max. 4 bases +1 (optional)

AR, N2, O2

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About Company Handling This Product

Panasonic Production Engineering Co., Ltd.

  • Japan

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