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  4. Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G (SAKIGAKE-Semiconductor)
Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G-YHS-G
Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G-SAKIGAKE-Semiconductor

Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G
SAKIGAKE-Semiconductor

SAKIGAKE-Semiconductor's Response Status

Response Rate

100.0%

Response Time

120.0hours

About This Product

A vacuum plasma device that can introduce various gases. Gas flow adjustment, power adjustment, and vacuum monitor You can set the precise processing conditions. We will provide simple operability of one touch, inexpensive price range that is easy to introduce. Surface treatment treatment before the formation of thin film formation before coating before coating and in other bios and medical fields.

■ Optional

･ Multiple conversion of gas introduction ･ Expansion / reduction of stage size ･ RF type We accept optional charges such as. Please contact us for details.

  • Product

    Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G

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1 Models of Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G

Image Part Number Price (excluding tax) External dimensions (mm) Stage dimension (mm)
Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G-Part Number-YHS-G

YHS-G

Available upon quote

562 (W) x 562 (D) x 360 (H)

φ100 ~

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About Company Handling This Product

SAKIGAKE-Semiconductor

Response Rate

100.0%

Response Time

120.0hrs

Related search keywords

Plasma Cleaning Systems
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