All Categories
History
This section provides an overview for chemical vapor deposition (cvd) systems as well as their applications and principles. Also, please take a look at the list of 18 chemical vapor deposition (cvd) system manufacturers and their company rankings. Here are the top-ranked chemical vapor deposition (cvd) system companies as of December, 2024: 1.Semicore Equipment, Inc. , 2.PVD Products, Inc., 3.Hi-Tech Furnace System, Inc..
Table of Contents
Categories Related to Chemical Vapor Deposition (CVD) Systems
Engaged in research on nitride semiconductor growth using the MBE method at Waseda University Graduate School. After graduating from graduate school in 2016, he joined a non-ferrous metal manufacturer.
Engaged in equipment maintenance and engineering work at metal smelting plants. Moved to a chemical manufacturer in 2022. Engaging in similar tasks.
A chemical vapor deposition (CVD) system is a device used for thin film growth and surface treatment. CVD utilizes a chemical reaction to deposit substances from the gas phase onto a solid surface, heating the substrate and delivering reactive gases to form films or coatings. This process is highly controllable, and reproducible, and enables precise control of film properties. However, care is needed due to the toxicity of many gases used.
CVD systems are vital in semiconductor manufacturing, optical coatings, and protective coatings. They are used to create insulating layers, conductive layers, spectral filters, anti-reflective coatings, and protective surfaces on various materials.
In the semiconductor industry, CVD is crucial for creating SiO2 films on silicon substrates, used as gate oxide and insulators, and for forming conductive layers with metals like copper or aluminum.
CVD is integral to producing multilayer optical filters, reflective mirror coatings for laser beams, and protective lens coatings.
Used for enhancing corrosion and wear resistance on metal surfaces, CVD is employed in surface treatment of cutting tools, sensors, and ceramic materials.
The CVD process involves supplying reaction gases to a heated substrate, where they chemically react and deposit elements and chemicals on the substrate surface. Control of deposition parameters is key to achieving desired thin film characteristics.
There are various CVD systems, each with unique mechanisms and applications.
Thermal CVD systems react raw material gases at high temperatures either on the substrate or within the vessel to create films. They come in two types: substrate-heated and container-heated.
Plasma CVD systems form films by creating a plasma state of the raw material gas and depositing it on the substrate. They are especially beneficial for semiconductor manufacturing requiring precise dimensions.
Optical CVD systems use light to initiate chemical reactions in the gas phase. They are capable of producing films at very low temperatures compared to other CVD systems.
*Including some distributors, etc.
Sort by Features
Sort by Area
Semicore Equipment, Inc. is a deposition equipment and custom vacuum systems manufacturer based in Livermore, California since 1996. The company showcases a diverse product catalog, serving multiple fields like the electronics, optical, solar energy, medical, and automotive industries. It produces items such as sputtering, evaporation, PVD coating and custom systems, as well as DLC tribology coaters and magnetron sputtering cathodes. In addition, the venture offers tooling and fixturing, innovative solutions and automation control services.
PVD Products, Inc., founded in and situated in Wilmington, MA, is a manufacturer of physical vapor deposition (PVD) systems and pulsed laser deposition (PLD) techniques. The company provides engineering and design services for PLD magnetron evaporation and sputtering services to clients all over the world, including start-ups, national labs, universities, organizations, and Fortune 500 companies. The company also produces customized chemical vapor deposition (CVD) devices for customers looking for tailored soultions. In June 2022, the company became a subsidiary of High Temperature Superconductors, Inc.
Hi-Tech Furnace Systems Inc., located in Shelby Township, Michigan has been a manufacturer and installer of retort style furnace systems since 1990. Its offerings encompass Fluoride Ion Cleaning (FIC) Systems, effectively removing contaminants from metal surfaces and proving advantageous for turbine engine components. Additionally, its Chemical Vapor Deposition (CVD) Systems deposit protective films onto metal substrates, elevating the quality of parts. Complementing these solutions are Vapor Phase Coating (VPC) Systems and Gas Delivery Systems, further enhancing its comprehensive array of specialized services.
SilcoTek, founded in 1987 and located in Bellefonte, Pennsylvania, US, is a supplier of inert coatings. The company offers multiple types of coatings, such as Silcolloy, Dursox, Dursan, SilcoNert, and Siltride, used to remove active components and enhance surface performance. The company's Siloguard is corrosion resistant for semiconductor fabrication, while Dursan is a hydrophobic coating suitable for refinery, chemical processing, and oil and gas applications. The products are also used in corrosion, semiconductor, and analytical applications.
CVD Equipment Corporation, founded in 1982 and based in Central Islip, New York, is a supplier of chemical vapor deposition and thermal process equipment. The company designs, develops, and manufactures a broad range of equipment and process solutions used to develop and manufacture materials and coatings for industrial applications and research. Its products are used in production environments as well as within academic, federal, and corporate research and development centers. With its expertise in CVD and thermal process equipment design and manufacturing, it is uniquely positioned to address the high-growth silicon carbide (SiC) market driven by global EV adoption.
IBC Coating Technologies, Ltd. is a company established in 1996 and based in Lebanon, Indiana, as a supplier of surface treatment equipment. Its product portfolio includes vacuum coatings, thermal diffusion coatings, hard chrome plating, and plasma electrolytic oxidation coatings equipment. The company has obtained several certifications, including AS 9100D and ISO 9001:2015 certifications. Its products are utilized for oil and gas, aerospace, automotive, metal forming, and die-casting industries across the United States.
SATO VAC INC., established in 1932 and based in Tokyo, Japan, is a manufacturer of vacuum equipment including vacuum pumps, measuring instruments, and parts & components. Its production line is segmented into vacuum pumps, gauges, and equipment used in space development, semiconductors, energy, medical, optics, and automobile industries. The company's vacuum equipment includes compact CVD systems, vacuum defoamers, heat treatment furnaces, dryers, and evaporation systems. The company's production process involves structural designing, prototype creation, design review, and performance testing.
SHINKO SEIKI CO., LTD., established in 1949, and located in Kobe, Japan, is a manufacturer of vacuum devices, electric furnaces and semiconductor manufacturing equipment. Its product line includes a vast array of vacuum pumps such as mechanical booster pumps, vacuum exhaust unit, oil sealed rotary vacuum pumps and water ring vacuum pumps. Its product range also inlcudes soldering equipments, optical inspection equipments, thin film forming equipments, and plasma processing equipments. The company holds several certification for its operation such as the ISO 14004, and the ISO 9001.
Ulvac Inc., established in 1952 and headquartered in Kanagawa, Japan, is a manufacturer of vacuum equipment, components, peripheral devices, and materials for the solar cell and semiconductor industries, among others. The company operates businesses in six areas, including materials, components, electronic devices, semiconductors, and flat panel display production equipment. Some of its products include roll coaters, semiconductor production equipment, LED production equipment, leak detectors, and vacuum brazing furnaces. It is ISO9001 certified, and its net sales in the 2022 fiscal year were 227.5 billion Japanese Yen, with 34% of this amount coming from semiconductor and electronic device production equipment.
Kamet, founded in 1988 and headquartered in Utrecht, Netherlands, is a supplier of various heating and temperature sensor products. The company specializes in mineral-insulated cables, exotic thermocouples, Pt100 sensors, thermocouple wire, and related instrumentation products. The products offered are used for optimal accuracy, durability, and resistance to extreme temperatures, making them ideal for applications in industries like aerospace, automotive, metallurgy, and research laboratories.
Zhengzhou Kejia Furnace Co., Ltd., established in 2005 and based in Zhengzhou, China, is a manufacturer of a comprehensive range of furnaces and heat treatment equipment. The company’s product offerings include tube furnaces, rotary tube furnaces, box furnaces, CVD (Chemical Vapor Deposition) systems, PECVD (Plasma Enhanced Chemical Vapor Deposition) systems, and customized furnaces to meet specific industrial needs. It holds ISO 9001 and CE certifications, and the equipment finds applications in various industries, including materials research, nanotechnology, electronics, and dental labs, resulting in advancements in research and manufacturing processes across multiple sectors.
Angstrom Engineering was founded in 1992, is a manufacturer of physical vapor deposition systems, coating equipment and supplies, headquartered in the United States. The company's PVD (physical vapor deposition), CVD (chemical vapor deposition), and other vacuum systems are suitable for a wide range of applications including thin film deposition research, 2D materials growth such as graphene and nanotubes, industrial coatings, OLED, photovoltaic and Perovskite research. Other offerings cover applications including space simulation and controlled environments for plant growth. It has grown into a thriving international company supported by its skilled and experienced engineering and R&D teams and world-class labs.
Sulzer Ltd. is a fluid engineering and chemical processing solutions manufacturer originally founded in 1775. The company has been headquartered in Winterthur, Switzerland since 1834, maintaining a network of 180 manufacturing facilities and service centers around the world. The company has an expansive product portfolio including distillation and absorption columns, agitators, reactors, crystallizers, and polymerization systems. These supply clients in the metals, plastics, chemicals, power, and pharmaceutical industries. Sulzer Ltd. also offers a range of services, such as testing and diagnostics, prototyping, retrofitting, and upgrades, including technical training with long-term support for their customers.
M.Watanabe Co., Ltd., founded in 1953 with headquarters in Koga City, Japan, is a manufacturer of semiconductor production equipment and materials. The company's extensive product line includes semiconductor manufacturing systems, semiconductors, and industrial components made from various materials, including silicone, carbon, quartz, and precision machined parts. Its services include the repair and maintenance of its semiconductor manufacturing systems. The company serves the semiconductor, electronics manufacturing, consumer product manufacturing, and pharmaceutical industries, among others.
Kindle Tech is a professional laboratory equipment supplier that was founded in 2015 and is headquartered in Zhengzhou, China. Its main activity is the supply of laboratory equipment, including analytical instruments, equipment for microbiology, and equipment for environmental analysis. The company also offers a wide range of services, such as installation, calibration, and maintenance. Kindle Tech's products are used by a wide range of customers, including academic institutions, pharmaceutical companies, and environmental testing laboratories. The organization, through its specialized teamwork and rich experienced engineers, provide custom made service and equipment, custom tailoring hardware and software equipment requirements to worldwide customers.
Lam Research Corporation, founded in 1980 and based in Fremont, California, is a global supplier of semiconductor fabrication equipment. Specializing in thin film deposition, plasma etch, and photoresist strip processes, the company utilizes a line of high-precision mass metrology systems, enabling an Å-level quantification to process changes, and accommodating parts up to 8 meters in size. Its products and services enable its customers to build smaller, faster, and power-efficient electronic devices.
Ranking as of December 2024
Derivation Method| Rank | Company | Click Share |
|---|---|---|
| 1 | Semicore Equipment, Inc. |
17.9%
|
| 2 | PVD Products, Inc. |
9.3%
|
| 3 | Hi-Tech Furnace System, Inc. |
9.0%
|
| 4 | Sulzer Ltd |
8.8%
|
| 5 | SilcoTek |
7.8%
|
| 6 | CVD Equipment Corporation |
7.7%
|
| 7 | IBC Coating Technologies, Ltd. |
7.2%
|
| 8 | Angstrom Engineering Inc. |
4.7%
|
| 9 | SATO VAC INC. |
4.3%
|
| 10 | ULVAC, Inc |
4.2%
|
Derivation Method
The ranking is calculated based on the click share within the chemical vapor deposition (cvd) system page as of December 2024. Click share is defined as the total number of clicks for all companies during the period divided by the number of clicks for each company.Number of Employees
Newly Established Company
Company with a History
*Including some distributors, etc.
*Including some distributors, etc.
| Country | Number of Companies | Share (%) |
|---|---|---|
|
United States of America
|
6 | 37.5% |
|
Japan
|
5 | 31.3% |
|
China
|
2 | 12.5% |
|
Netherlands
|
1 | 6.3% |
|
Canada
|
1 | 6.3% |
|
Switzerland
|
1 | 6.3% |
38 products found - Page 1
38 products - Page 1
M.WATANABE & CO.,LTD.
50+ people viewing
Last viewed: 22 hours ago
Single-wafer atmospheric pressure CVD (APCVD) equipment for forming NSG (SiO2) /PSG/BPSG films for small quantities and a wide variety of products ...
M.WATANABE & CO.,LTD.
50+ people viewing
Last viewed: 1 hour ago
High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...
M.WATANABE & CO.,LTD.
60+ people viewing
Last viewed: 8 hours ago
High productivity continuous atmospheric pressure CVD (APCVD) equipment for NSG (SiO2) /PSG/BPSG film formation for mass production (compatible wit...
Arios Co., Ltd.
50+ people viewing
Last viewed: 9 hours ago
Very Fast Response
■Summary This equipment is a microwave plasma CVD equipment for diamond production. By making full use of our unique plasma technology, we have ach...
Microphase Co., Ltd.
50+ people viewing
Last viewed: 7 hours ago
For CNT synthesis, carbon film formation, nanoceramic film formation, nitriding, chalcogenide film formation, etc. ■Purpose This is a general-purp...
M.WATANABE & CO.,LTD.
70+ people viewing
Last viewed: 16 hours ago
Batch type (simultaneous processing of multiple sheets) APCVD equipment for NSG (SiO2) /BSG/PSG/BPSG film formation for prototyping, development, a...
Microphase Co., Ltd.
40+ people viewing
Last viewed: 2 hours ago
For carbon coating on powder surfaces/various heat treatments, etc. ■Purpose This is a rotary tube furnace CVD device for CVD coating a carbon fil...
Arios Co., Ltd.
40+ people viewing
Last viewed: 6 hours ago
Very Fast Response
■Summary This device is a hot filament type CVD device for full-scale diamond synthesis. By selecting various options in addition to the basic syst...
M.WATANABE & CO.,LTD.
40+ people viewing
Last viewed: 5 hours ago
High productivity continuous atmospheric pressure CVD (APCVD) equipment for mass production of crystalline Si solar cells NSG (SiO2) /PSG/BSG film ...
Microphase Co., Ltd.
40+ people viewing
Last viewed: 6 hours ago
Significant increase in production through continuous processing ■Purpose This is a continuous CVD processing method for mass production devised b...
Microphase Co., Ltd.
50+ people viewing
Last viewed: 9 hours ago
Facilitates gas ionization and precursor decomposition ■Summary ・By generating high-frequency induced plasma upstream of the horizontal tube furn...
M.WATANABE & CO.,LTD.
40+ people viewing
Last viewed: 5 hours ago
This is a 4.5 generation glass substrate deposition system compatible with rigid/flexible devices such as FPDs. ■Basic information Equipped with t...
Arios Co., Ltd.
30+ people viewing
Last viewed: 8 hours ago
Very Fast Response
■Summary CVD is an abbreviation for Chemical Vapor Deposition, and refers to the process of supplying a raw material with gas, decomposing it with ...
Microphase Co., Ltd.
50+ people viewing
Last viewed: 7 hours ago
Pattern film formation by laser drawing is possible. ■Summary ・In the sample chamber of a commercially available fiber laser processing machine, ...
Japan Create Co., Ltd.
510+ people viewing
Last viewed: 9 hours ago
5.0 Company Review
It is a film forming device specialized in DLC coating that we are good at, applying plasma CVD processing technology and is commonly used as resin...
Microphase Co., Ltd.
10+ people viewing
Last viewed: 1 hour ago
Japan Create Co., Ltd.
360+ people viewing
Last viewed: 6 hours ago
5.0 Company Review
It is a film forming device specialized in DLC coating that we are good at, applying plasma CVD processing technology and is commonly used as resin...
Irie Co., Ltd.
40+ people viewing
Last viewed: 22 hours ago
Standard Response
4.5 Company Review
■Summary This is a tubular furnace-type high-temperature thermal CVD device suitable for developing various materials using hydrocarbon compounds s...
20+ people viewing
Last viewed: 1 day ago
■Features ・Generate graphene/CNT in just 30 minutes ・Cold wall type high-speed, high-precision process control ・Today's right heating stage: RT ...
HiSOL,Inc.
140+ people viewing
Last viewed: 11 hours ago
This is a tabletop silane CVD device for R&D that can perform automatic batch processing from plasma cleaning to workpiece dehydration to silane CV...
Kitano Seiki Co., Ltd.
30+ people viewing
Last viewed: 11 hours ago
■Features This device is a hot wire type CVD device that uses a tungsten filament, and has the characteristics of large area and high purity thin f...
Japan Create Co., Ltd.
350+ people viewing
Last viewed: 1 day ago
5.0 Company Review
■ Characteristics ・ Realizes low stress, high hardness, and high insulation by 2 frequency independent sealing method. ・ Realizes excellent membr...
MPS Co., Ltd.
140+ people viewing
Last viewed: 1 day ago
■Summary This is an experimental device for making nitrides. The raw materials used are chloride and ammonia. For film formation, you can choose be...
MPS Co., Ltd.
110+ people viewing
Last viewed: 5 hours ago
■Summary This is a hot filament CVD device for experimental use. We will design the equipment according to your company's needs.
MPS Co., Ltd.
150+ people viewing
Last viewed: 1 day ago
■Summary We have developed a compact hot filament CVD device to easily form diamond films. The chamber is made of aluminum alloy and is forced air ...
MPS Co., Ltd.
100+ people viewing
Last viewed: 6 hours ago
■Summary This is a mode conversion type microwave CVD device. It is used as an experimental device at a university.
MPS Co., Ltd.
110+ people viewing
Last viewed: 5 hours ago
■Summary This is a plasma CVD device for diamond-like carbon that uses DC high-voltage pulse discharge. Methane or acetylene can be selected as the...
MPS Co., Ltd.
160+ people viewing
Last viewed: 11 hours ago
■Summary This is a plasma CVD device that uses RF (13.56MHz). DLC film formation is possible even on insulating materials.
ShinMaywa Industries, Ltd.
50+ people viewing
Last viewed: 5 hours ago
■What is diamond coating? As the hardest material in existence, diamond has excellent mechanical, electrical, chemical, and thermal conductivity pr...
20+ people viewing
■Applications ・Graphene synthesis ・Carbon nanotube ・ZnO nanowire ・Nano diamond ・Insulating film/protective film (Sic, TiN, etc.) ・Other therm...
