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  4. High-frequency power supply vacuum plasma device US-80A (SAKIGAKE-Semiconductor)
High-frequency power supply vacuum plasma device US-80A-US-80A
High-frequency power supply vacuum plasma device US-80A-SAKIGAKE-Semiconductor

High-frequency power supply vacuum plasma device US-80A
SAKIGAKE-Semiconductor

SAKIGAKE-Semiconductor's Response Status

Response Rate

100.0%

Response Time

120.0hours

About This Product

Up to 80 plasma processing is possible with a maximum of 500ml bottles at a time. By replacing the electrode, it supports bottles with various capacity and shape.

■ Use

･ Inner and outer surface modification device ･ Treatment in cell culture containers ･ Preparing surface printing of metal containers such as PET bottles, glass bottles, cans

■ Optional

Power supply 3 phase 200V15A + single -phase 200V15A, pressure air CDA0.3MPa * Vacuum pumps are sold separately. In addition, we accept specification changes separately.

  • Product

    High-frequency power supply vacuum plasma device US-80A

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1 Models of High-frequency power supply vacuum plasma device US-80A

Image Part Number Price (excluding tax) External dimensions weight Operating system Processing pressure adjustment Throughput Gas introduction power supply
High-frequency power supply vacuum plasma device US-80A-Part Number-US-80A

US-80A

Available upon quote

W745mm, D695mm, H1,445mm (lid closing, without protrusions)

Approximately 250kg

Touch panel

APC process pressure automatic control

80 / batch (when using Iboy 500ml bottle (diameter 75mm, height 160mm))

Automatic flow control by 1 system, MFC

13.56MHz max.1kw

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About Company Handling This Product

SAKIGAKE-Semiconductor

Response Rate

100.0%

Response Time

120.0hrs

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