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  4. Powdered body processing rotary table vacuum plasma device YHS-Dφs (SAKIGAKE-Semiconductor)
Powdered body processing rotary table vacuum plasma device YHS-Dφs-YHS-Dφs
Powdered body processing rotary table vacuum plasma device YHS-Dφs-SAKIGAKE-Semiconductor

Powdered body processing rotary table vacuum plasma device YHS-Dφs
SAKIGAKE-Semiconductor

SAKIGAKE-Semiconductor's Response Status

Response Rate

100.0%

Response Time

120.0hours

About This Product

Ideal for processing powder and chip capacitors. A rotating mechanism has been added to the vacuum plasma so that the entire surface can be processed at once.

■ Product overview

･ High processing effect for surface modification / cleaning / hydrophilic treatment ･ Batch processing of the front and back by rotating chamber ･ The surface treatment of the powder is possible in the dry environment ･ Distribute rotating tubular electrodes in the chamber ･ Discharge high -frequency to the electrode in the center facing cylindrical electrodes -The processing work rolls in the rotating chamber and can be processed in front and back lump. ･ Washing resin -produced products ･ Washing pre -treatment MEMS cleaning, etc. ･ Etching of powder and small parts for powdered surface treatment in a dry environment ･ Light film formation ･ Water repelliation ･ Reduction oxidation.

  • Product

    Powdered body processing rotary table vacuum plasma device YHS-Dφs

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1 Models of Powdered body processing rotary table vacuum plasma device YHS-Dφs

Image Part Number Price (excluding tax) External dimensions weight Rotation part Gas system Gas control method power supply
Powdered body processing rotary table vacuum plasma device YHS-Dφs-Part Number-YHS-Dφs

YHS-Dφs

Available upon quote

820mm (W) x 600mm (d) x 680mm (H)

100kg

φ210 × 200mm (d)

1 system (2 or more systems are optional)

Needle valve (mass flow controller is optional)

100V, 30A (50Hz/60Hz)

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About Company Handling This Product

SAKIGAKE-Semiconductor

Response Rate

100.0%

Response Time

120.0hrs

Related search keywords

Plasma Cleaning Systems
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