SAKIGAKE-Semiconductor's Atmospheric pressure plasma device
13 registered Atmospheric pressure plasma device of SAKIGAKE-Semiconductor
SAKIGAKE-Semiconductor
Attachment (direct) direct type atmosphere pressure plasma device D300-TB
■ Product overview ･ No introduction gas required, surface modification is possible in air ･ Wide slit irradiation is possible (~ 1,000mm) ･ High p...
SAKIGAKE-Semiconductor
Attachment (direct) Desktop direct type Air pressure plasma device TK-50
■ Product overview ·Low price ･ Small size - Easy combination with other devices - Good handling by integrating the processing unit and the operat...
SAKIGAKE-Semiconductor
Attotive pressure (direct) brush type atmosphere pressure plasma surface modification device GET A COMMAND OF (GACO-200)
Plasma processing is possible on the surface that is curved with a stainless steel wire brush. ■ Characteristics of products ･ The electrode can a...
SAKIGAKE-Semiconductor
Attotive pressure (direct) Plasma device in the liquid DKN-128
■ Product overview ･ Improvement of diversification of powder by plasma in the liquid ･ We will improve production efficiency by continuous process...
SAKIGAKE-Semiconductor
Attotive pressure (direct) Attotive pressure liquid powder plasma processing device full-scale research PPU-800
The powder does not scatter because it is a windless treatment. Mix the flour that was not mixed with the liquid. Promotes aggregation of difficult...
SAKIGAKE-Semiconductor
Attotive pressure (direct) Attotive pressure liquid powder plasma processing device ASS-400
Mix with liquid by surface treatment of powder without a surfactant. Preparation: Filer preprocessing, baked powder pretreatment. Others: For the d...
SAKIGAKE-Semiconductor
Attotive pressure (remote) Low-temperature pen type air pressure plasma device Barrier-20
Attached plasma processing at lower temperature and lower flow at low flow. Surface modification: In a atmospheric pressure environment, plasma wit...
SAKIGAKE-Semiconductor
Attotive pressure (remote) gas fleeping type atmosphere pressure plasma device NRSR-P10
■ Product overview ･ Easy to handle with pentab ･ No gas supply is required, it can be used only with AC100V power connection ･ Easy operation ･ Sm...
SAKIGAKE-Semiconductor
Attotive pressure (remote) Simple atmosphere pressure plasma device A1000
Handy type and easy to handle. Surface treatment treatment before the formation of thin film formation before coating before coating and in other b...
SAKIGAKE-Semiconductor
Attotive pressure (remote) brushed plasma device S5000-FS2
■ Product overview ･ Guide plasma with many flexible ultra -fine tubes to achieve complex shapes. ･ Continuous processing is possible ･ Switching t...
SAKIGAKE-Semiconductor
Attotive pressure (remote) tube inner wall center wall air pressure plasma device S5000-T
■ Product overview ･ Wash the inner wall of the tube in the air pressure environment and modify the surface ･ Continuous processing is possible ･ S...
SAKIGAKE-Semiconductor
Attotive pressure (remote) slit type atmosphere pressure plasma device S5000-BM
■ Product overview ･ Stable plasma that does not damage charge in the atmospheric pressure environment (It is not an arc state with a concentrated...
SAKIGAKE-Semiconductor
Attotive pressure (remote) pen type air pressure plasma device P500-SM
■ Product overview ･ Surface modification: In a atmospheric pressure environment, plasma without charge damage is generated stably ･ Wire bonding: ...
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