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SAKIGAKE-Semiconductor's Atmospheric pressure plasma device

SAKIGAKE-Semiconductor

13 products found

SAKIGAKE-Semiconductor

Attotive pressure (remote) Simple atmosphere pressure plasma device A1000

260+ people viewing

Last viewed: 23 hours ago

Response Rate
100.0 %
Response Time
120.0 hours

Handy type and easy to handle. Surface treatment treatment before the formation of thin film formation before coating before coating and in other b...

SAKIGAKE-Semiconductor

Attotive pressure (direct) Attotive pressure liquid powder plasma processing device ASS-400

340+ people viewing

Last viewed: 10 hours ago

Response Rate
100.0 %
Response Time
120.0 hours

Mix with liquid by surface treatment of powder without a surfactant. Preparation: Filer preprocessing, baked powder pretreatment. Others: For the d...

SAKIGAKE-Semiconductor

Attotive pressure (remote) Low-temperature pen type air pressure plasma device Barrier-20

280+ people viewing

Response Rate
100.0 %
Response Time
120.0 hours

Attached plasma processing at lower temperature and lower flow at low flow. Surface modification: In a atmospheric pressure environment, plasma wit...

SAKIGAKE-Semiconductor

Attachment (direct) direct type atmosphere pressure plasma device D300-TB

300+ people viewing

Last viewed: 22 hours ago

Response Rate
100.0 %
Response Time
120.0 hours

■ Product overview ・ No introduction gas required, surface modification is possible in air ・ Wide slit irradiation is possible (~ 1,000mm) ・ High p...

SAKIGAKE-Semiconductor

Attotive pressure (direct) Plasma device in the liquid DKN-128

290+ people viewing

Last viewed: 14 hours ago

Response Rate
100.0 %
Response Time
120.0 hours

■ Product overview ・ Improvement of diversification of powder by plasma in the liquid ・ We will improve production efficiency by continuous process...

SAKIGAKE-Semiconductor

Attotive pressure (direct) brush type atmosphere pressure plasma surface modification device GET A COMMAND OF (GACO-200)

300+ people viewing

Last viewed: 1 day ago

Response Rate
100.0 %
Response Time
120.0 hours

Plasma processing is possible on the surface that is curved with a stainless steel wire brush. ■ Characteristics of products ・ The electrode can a...

SAKIGAKE-Semiconductor

Attotive pressure (remote) gas fleeping type atmosphere pressure plasma device NRSR-P10

620+ people viewing

Last viewed: 6 hours ago

Response Rate
100.0 %
Response Time
120.0 hours

■ Product overview ・ Easy to handle with pentab ・ No gas supply is required, it can be used only with AC100V power connection ・ Easy operation ・ Sm...

SAKIGAKE-Semiconductor

Attotive pressure (remote) pen type air pressure plasma device P500-SM

330+ people viewing

Last viewed: 13 hours ago

Response Rate
100.0 %
Response Time
120.0 hours

■ Product overview ・ Surface modification: In a atmospheric pressure environment, plasma without charge damage is generated stably ・ Wire bonding: ...

SAKIGAKE-Semiconductor

Attotive pressure (direct) Attotive pressure liquid powder plasma processing device full-scale research PPU-800

260+ people viewing

Last viewed: 1 hour ago

Response Rate
100.0 %
Response Time
120.0 hours

The powder does not scatter because it is a windless treatment. Mix the flour that was not mixed with the liquid. Promotes aggregation of difficult...

SAKIGAKE-Semiconductor

Attotive pressure (remote) slit type atmosphere pressure plasma device S5000-BM

260+ people viewing

Last viewed: 6 hours ago

Response Rate
100.0 %
Response Time
120.0 hours

■ Product overview ・ Stable plasma that does not damage charge in the atmospheric pressure environment (It is not an arc state with a concentrated...

SAKIGAKE-Semiconductor

Attotive pressure (remote) brushed plasma device S5000-FS2

280+ people viewing

Response Rate
100.0 %
Response Time
120.0 hours

■ Product overview ・ Guide plasma with many flexible ultra -fine tubes to achieve complex shapes. ・ Continuous processing is possible ・ Switching t...

SAKIGAKE-Semiconductor

Attotive pressure (remote) tube inner wall center wall air pressure plasma device S5000-T

300+ people viewing

Response Rate
100.0 %
Response Time
120.0 hours

■ Product overview ・ Wash the inner wall of the tube in the air pressure environment and modify the surface ・ Continuous processing is possible ・ S...

SAKIGAKE-Semiconductor

Attachment (direct) Desktop direct type Air pressure plasma device TK-50

330+ people viewing

Last viewed: 18 minutes ago

Response Rate
100.0 %
Response Time
120.0 hours

■ Product overview ·Low price ・ Small size - Easy combination with other devices - Good handling by integrating the processing unit and the operat...


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