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  4. Attotive pressure (remote) brushed plasma device S5000-FS2 (SAKIGAKE-Semiconductor)


Attotive pressure (remote) brushed plasma device S5000-FS2-S5000-FS2
Attotive pressure (remote) brushed plasma device S5000-FS2-SAKIGAKE-Semiconductor

Attotive pressure (remote) brushed plasma device S5000-FS2
SAKIGAKE-Semiconductor

About This Product

■ Product overview ･ Guide plasma with many flexible ultra -fine tubes to achieve complex shapes. ･ Continuous processing is possible ･ Switching torch according to the target ･ Follow the unevenness surface, the corners ･ Compatible with large unevenness and complex shapes

  • Product

    Attotive pressure (remote) brushed plasma device S5000-FS2



*Please note that we may not be able to accommodate sample requests.

1 Models of Attotive pressure (remote) brushed plasma device S5000-FS2

Product Image Part Number Price (excluding tax) External dimensions Flow rate adjustment Gas used Output adjustment power supply
Attotive pressure (remote) brushed plasma device S5000-FS2-Part Number-S5000-FS2

S5000-FS2

Available upon quote 320mm (W) x 430mm (d) x 177mm (H), (torch part) 60mm x 20mm x 100mm can be N2 / AR / HE can be 100V (50Hz/60 Hz)

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