Sputtering equipment for R&D QAM series-QAM-4C-S

Sputtering equipment for R&D QAM series
ULVAC Sales Co., Ltd.

ULVAC Sales Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

125.8hours

About This Product

■SummaryThis is a device that can be used in a wide range of applications, based on ULVAC's extensive film-forming technology and experience. Achieved miniaturization while providing versatility and expandability. Process chambers and exhaust systems can be freely combined to suit your application.

■ApplicationsBased on ULVAC's extensive film-forming technology and experience, this low-cost R&D equipment can handle a wide range of functions required for small-scale experimental applications such as all kinds of research and development and material development.

■Can be customized to suit your experiment/research purpose/budgetWe have built a unit that can be expanded by incorporating plenty of the technology and know-how we have cultivated over the years. For example, by adding each module to the base machine, it is possible to eventually create a 2-module machine (with L/L room). In addition, you can choose between mechanical and electrical integrated type and control module separated type to suit your layout.

■Achieve advanced functions, intuitive operation, and safety・Safe and secure with intuitive operation
・Process data can be analyzed with peace of mind (data logging: optional)
・Recipe control enables film formation with good reproducibility
・Stable operation of equipment with interlock equivalent to production equipment

■Low pressure processIt has a discharge sustaining pressure range of approximately 1Pa to 0.1Pa, allowing dense film formation by sputtering at a lower pressure than before.

■Multi-dimensional simultaneous/multi-layer sputter depositionBecause each cathode aims at the center of the substrate, simultaneous multi-source sputtering is possible. Laminated films can be created using shutter control. Also, by using a jig (optional), static counter sputtering is also possible.

■Support for magnetic thin filmThe same cathode can be used with various magnetic materials (Fe, Ni, Co, etc.)

■Adoption of LTSBy adopting LTS*1, it is possible to minimize the influence of non-uniform plasma near the cathode on the substrate. It is also possible to minimize the influence of the cathode magnet's magnetic field.
Note) *1: LTS: Long Throw Sputter

■UHV compatible (QAM-4-S only)By using bakeable equipment, the ultimate pressure in the film forming chamber can be kept below 1 x 10-6Pa*2.
Note) *2: Adopts a double O-ring seal structure (intermediate exhaust), greatly improving maintainability compared to conventional metal seals.

Model
There is 1 model available for this product.

Product
Sputtering equipment for R&D QAM series

Handling Company
ULVAC Sales Co., Ltd.

Categories

Machining / Machine Tools

Sputtering Equipment

220+ people viewing

Last viewed: 5 hours ago

Free
Get started with our free quotation service - no cost, no obligation.

No Phone Required
We respect your privacy. You can receive quotes without sharing your phone number.

1 Models of Sputtering equipment for R&D QAM series

Image	Part Number	Price (excluding tax)	Electricity	Film thickness distribution	Maximum gas introduction amount	Onboard power supply	Exhaust system	Exhaust	Film formation	Compatible board size	Substrate heating mechanism	Compressed air	Ultimate pressure	Processing method	Cooling water	Chamber baking	Target size	Cathode method	Number of cathodes	Earth
	QAM-4C-S	Available upon quote	3φAC200V 50/60Hz	Within ±5% (combined with substrate rotation during Al film formation)	1) Max.50sccm (Ar) 2) Max.10sccm (O2) 3) Max.10sccm (N2)	DC500W 1 unit ・DC500W, RF300W2 can be selected, and up to 2 units can be installed Optional	1) Turbo pump 2) Rotary pump Dry pump *Optional	Touch panel (PLC control) Remote manual3 Fully automatic4 3: Manual/semi-automatic operation from touch panel 4: Recipes such as power and time can be input using the touch panel.	Touch panel (PLC control) Remote manual3 Fully automatic4 3: Manual/semi-automatic operation from touch panel 4: Recipes such as power and time can be input using the touch panel.	Max.φ4 inch x 1 piece	Lamp heater Regular use 400℃ *Optional	0.5~0.7MPa	1×10-4Pa or less	Batch type	20~28℃, specific resistance 5KΩ or more, supply pressure 0.2~0.3MPa	Bake at 110℃ (chamber water cooling included) *Optional	Φ2 inch	Long throw magnetron sputtering ・Helicon sputter1 Optional	2 inch cathode (for both magnetic and non-magnetic materials) Up to 4 units can be installed	A class, D class

Customers who viewed this product also viewed

Reviews shown here are reviews of companies.

Spatta device Small magnetron patta device MSP -mini

Vacuum device

390+ people viewing

Last viewed: 3 minutes ago

Response time: 40.22 hours

Sputtering Equipment

Completely automatic magnetron patta device for spatta equipment electron microscope MSP-1S

Vacuum device

460+ people viewing

Last viewed: 12 minutes ago

Response time: 40.22 hours

Sputtering Equipment

Powder sputtering equipment

ASD Co., Ltd.

150+ people viewing

Last viewed: 16 hours ago

Sputtering Equipment

Compact sputtering equipment for research and development FDS/FRS Series

FKD Factory Co., Ltd.

190+ people viewing

Last viewed: 11 minutes ago

Sputtering Equipment

Spatta device Multipurpose Simple operating type Magnetron Patta Silamon Memoral Ms. MSP-40T

Vacuum device

350+ people viewing

Last viewed: 18 hours ago

Response time: 40.22 hours

Sputtering Equipment

Sputter device with full automatic function precious metal coat MSP-20-Um

Vacuum device

330+ people viewing

Last viewed: 18 hours ago

Response time: 40.22 hours

Sputtering Equipment

Sputter device 4 inch turtle get precious metal coat with full automatic function MSP-20-MT

Vacuum device

300+ people viewing

Last viewed: 5 hours ago

Response time: 40.22 hours

Sputtering Equipment

Small sputtering equipment SS-DC RF301

Arios Co., Ltd.

130+ people viewing

Last viewed: 5 hours ago

Response time: 1.69 hours

Sputtering Equipment

2 models listed

Sputter device for FE-SEM tungsten coat MSP-20-TK

Vacuum device

420+ people viewing

Last viewed: 18 hours ago

Response time: 40.22 hours

Sputtering Equipment

Multi-chamber sputtering equipment SME-200 series

ULVAC Sales Co., Ltd.

170+ people viewing

Last viewed: 18 hours ago

Response time: 125.77 hours

Sputtering Equipment

Spatta device 8 inch target precious metal coat MSP-8in

Vacuum device

280+ people viewing

Last viewed: 8 minutes ago

Response time: 40.22 hours

Sputtering Equipment

Back side/mounting sputtering equipment SRH series

ULVAC Sales Co., Ltd.

170+ people viewing

Last viewed: 7 minutes ago

Response time: 125.77 hours

Sputtering Equipment

See More Sputtering Equipment Products

Other products of ULVAC Sales Co., Ltd.

Reviews shown here are reviews of companies.

Pirani vacuum gauge GP-G series

ULVAC Sales Co., Ltd.

100+ people viewing

Last viewed: 20 hours ago

Response time: 125.77 hours

Pirani Vacuum Gauge

Aspirator MDA-015A

ULVAC Sales Co., Ltd.

100+ people viewing

Last viewed: 5 hours ago

Response time: 125.77 hours

Aspirators

Multi-chamber sputtering equipment SME-200 series

ULVAC Sales Co., Ltd.

170+ people viewing

Last viewed: 18 hours ago

Response time: 125.77 hours

Sputtering Equipment

Back side/mounting sputtering equipment SRH series

ULVAC Sales Co., Ltd.

170+ people viewing

Last viewed: 7 minutes ago

Response time: 125.77 hours

Sputtering Equipment

Optical film sputtering equipment ULDiS series

ULVAC Sales Co., Ltd.

150+ people viewing

Last viewed: 14 minutes ago

Response time: 125.77 hours

Sputtering Equipment

Horizontal inline sputtering equipment SCH series

ULVAC Sales Co., Ltd.

130+ people viewing

Last viewed: 14 minutes ago

Response time: 125.77 hours

Sputtering Equipment

Multi-chamber sputtering equipment ENTRONTM-EX2 W300

ULVAC Sales Co., Ltd.

90+ people viewing

Last viewed: 3 hours ago

Response time: 125.77 hours

Sputtering Equipment

Multi-chamber device ENTRONTM N300

ULVAC Sales Co., Ltd.

130+ people viewing

Last viewed: 14 hours ago

Response time: 125.77 hours

Sputtering Equipment

Batch type high vacuum evaporation equipment ei series

ULVAC Sales Co., Ltd.

130+ people viewing

Response time: 125.77 hours

Vacuum Vapor Deposition Devices

High-density plasma dry etching equipment ULHITETM NE-7800H

ULVAC Sales Co., Ltd.

110+ people viewing

Last viewed: 16 minutes ago

Response time: 125.77 hours

Etching Equipment

2 models listed

Small freeze vacuum dryer DFM series

ULVAC Sales Co., Ltd.

160+ people viewing

Last viewed: 5 hours ago

Response time: 125.77 hours

Freeze Dryers

Diaphragm type dry vacuum pump DA-30D

ULVAC Sales Co., Ltd.

90+ people viewing

Response time: 125.77 hours

Vacuum Pumps

2 models listed

View more products of ULVAC Sales Co., Ltd.

About Company Handling This Product

ULVAC Sales Co., Ltd.

Response Rate

100.0%

Response Time

125.8hrs

Japan

Related search keywords

This is the version of our website addressed to speakers of English in the United States. If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.

Sputtering equipment for R&D QAM series ULVAC Sales Co., Ltd.

ULVAC Sales Co., Ltd.'s Response Status

About This Product

■Summary

■Applications

■Can be customized to suit your experiment/research purpose/budget

■Achieve advanced functions, intuitive operation, and safety

■Low pressure process

■Multi-dimensional simultaneous/multi-layer sputter deposition

■Support for magnetic thin film

■Adoption of LTS

■UHV compatible (QAM-4-S only)

1 Models of Sputtering equipment for R&D QAM series

QAM-4C-S

Customers who viewed this product also viewed

Other products of ULVAC Sales Co., Ltd.

About Company Handling This Product

Related search keywords

Sputtering equipment for R&D QAM series
ULVAC Sales Co., Ltd.