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Atomic Layer Deposition-Atomic layer deposition equipment
Atomic Layer Deposition-Hokkai Photoelectronics Co., Ltd.

About This Product

■Product overview

Atom layers are built up one by one on the substrate inside the vacuum chamber by repeating the following cycle. ・Adsorbs organic metal molecules to the surface through heat control ・Film formation by chemical reaction ・Removal of excess molecules by purging The reaction-based film formation process enables uniform layer control at the level of a single atomic layer through the action of chemical reactions, making it possible to form a high-quality curtain with high step coverage (irregularities, etc.).

■Features

- Prevent contamination by improving the exhaust system. - Improved uniformity of heater control. ・Reproducibility is improved by controlling the temperature of each source flow. ・Always supplies a constant source with precise valve control. - Unique design suppresses heat conduction to the chamber. ・Uniform, high-voltage Al₂O₃ gate insulating film, etc. can be easily formed on vertical quantum dots with good controllability. - Film can be formed on three-dimensional irregularities.

  • Product

    Atomic Layer Deposition

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1 Models of Atomic Layer Deposition

Image Part Number Price (excluding tax) Power supply Exhaust system Gas introduction valve for film formation Board heater Compressed air inlet Control system Ultimate vacuum Purge gas introduction valve Wafer size Others
Atomic Layer Deposition-Part Number-Atomic layer deposition equipment

Atomic layer deposition equipment

Available upon quote

Three phase 200V/50A

Dry pump

4 units

350℃MAX (ф130)

Ф6mm

Control PLC/touch panel

5Pa or less

1 unit

4 inches

With emergency stop function

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