Attotive pressure (remote) dielectric barrier discharge device surface type SKIP-CBL300
SAKIGAKE-Semiconductor
About This Product
Attotive pressure (remote) dielectric barrier discharge device surface type SKIP-CBL300 (Technology of Kyoto University Dr. Sakai)
Realizes uniform processing to 300mm square. There is almost no heat damage. It is not an arc state with a concentrated current like a corona discharge. Plasma of all gas. Not only rare gas such as AR and HE, but also nitrogen and air can be easily converted.
■ Product overview
･ Realize uniform processing to 300mm square.
→ Because plasma is generated on a surface, batch processing is possible.
･ There is almost no damage due to heat.
→ It is possible to process a vulnerable sample against heat.
･ It is not an arc state with a concentrated current like a corona discharge.
→ Do not cause charge damage to processed objects.
･ Plasma of all gas.
→ Not only rare gas such as AR and HE, but also nitrogen and air can be easily converted.
■ Optional
･ Multiple conversion of supply gas systems
･ 1-axis robot X-Y robot R to R
･ Touch panel control
･ We will respond to the addition of the coot (spray dip slit) and the addition of the drying process and other requests.
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Product
Attotive pressure (remote) dielectric barrier discharge device surface type SKIP-CBL300
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Handling Company
SAKIGAKE-Semiconductor
1 Models of Attotive pressure (remote) dielectric barrier discharge device surface type SKIP-CBL300
| Product Image | Part Number | Price (excluding tax) | Electrode process | Gas flow control mechanism | Gas flow meter | Process pressure | Recommended gas | power supply |
|---|---|---|---|---|---|---|---|---|
|
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SKIP-CBL300 |
Available upon quote | ~ ◻︎300mm | Ukiko type ORMFC | Up to 1,000L/min | Atmospheric pressure |
Argon * Discharge will be discharged even with other gas. |
AC200V |
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