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  4. PVD film deposition equipment for solar cells GENERIS PVD (Media Institute Co., Ltd.)
PVD film deposition equipment for solar cells GENERIS PVD-GENERIS PVD
PVD film deposition equipment for solar cells GENERIS PVD-Media Institute Co., Ltd.

PVD film deposition equipment for solar cells GENERIS PVD
Media Institute Co., Ltd.

About This Product

■Summary

Numerous vacuum sputtering systems are in operation in the photovoltaic manufacturing industry, and SINGULUSTECHNOLOGIES offers GENERIS PVD as a high-throughput in-line sputtering system platform with horizontal substrate transport. GENERIS PVD is designed for the specific requirements of manufacturing high performance HJT solar cells. GENERIS PVD ideally meets the key requirements of heterojunction cell technology in terms of advanced transparent conductive oxide layers (TCO) such as ITO (indium tin oxide) and AZO (aluminum doped zinc oxide). By applying a coating on both sides, it is automatically transported through the process chamber of GENERIS PVD. The sputtering system protects a high level of layer thickness uniformity with high layer reproducibility, high productivity and at the same time very low operating costs (OPEX).

■Function

・Sputtering materials: metal layers such as ITO, AZO, Mo, Al, Cu, Ag, NiV, etc. Typical applications include antireflection layers, barrier layers, precursors, and metal layers ・Parallel processing of multiple boards ・Available in 4 versions: GENERIS LAB ・GENERIS PVD3000 approx. 3,000 wph (M6) ・GENERIS PVD6800 approx. 6,800 wph (M6) ・GENERIS PVD10000 approx. 10,000 wph (M6) ・Carrier loading area: 1,400mm x 1,600/2,000mm ・Normal takt time: 40-75 seconds per carrier ・Parallel processing of substrates (displays, glass, Si wafers, etc.) via carrier trays ・Fast automation of carrier tray loading and unloading (single-sided or double-sided) ・Top-down and bottom-up sputtering configuration possible – double-sided sputtering without vacuum breakdown ・Complete substrate temperature control - Rotatable cylindrical magnetron ・Carrier return system (CRS) at the bottom of the device ・Vacuum base pressure: ‹1 x 10-6 mbar, normal process pressure: 2-5 x10-3 mbar Target utilization of rotatable cathodes is approximately 80% compared to only 30% for planar cathodes. ・More stable process with rotatable cathode due to less nozzle formation

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    PVD film deposition equipment for solar cells GENERIS PVD

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1 Models of PVD film deposition equipment for solar cells GENERIS PVD

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PVD film deposition equipment for solar cells GENERIS PVD-Part Number-GENERIS PVD

GENERIS PVD

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Media Institute Co., Ltd.

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