Ashing device Luminous NA series
ULVAC Sales Co., Ltd.
About This Product
■Summary
The Luminous NA series is a wafer size-free ashing system that can handle a wide range of processes from critical next-generation wafer processes to wafer-level mounting processes.
■Applications
・Ion implant removal process (1 x 1,016atoms/cm2 or more) and polymer removal in front-end process
・Wafer process that requires CF4 addition process (electronic components/LED)
・Chip size packaging and BUMP process
・CCD color filter manufacturing process
■Features
・Ion implant stripping process and polymer removal process of 1x1,016 atoms/cm2 or more required for critical next-generation wafer processes can be realized without damage.
・The chamber configuration is optimal for the F-based gas addition process, making it particle-free. Therefore, it is possible to construct a wide range of processes, from normal PR to ion implant peeling, organic film peeling (PI, DFR, etc.) peeling, and oxide film etching.
・Using a simple device configuration, we have achieved "excellent maintenance and reliability" and "low cost" at the same time.
- Flexible chamber configurations are possible (μwave, RIE, μwave + RIE), allowing for a wide variety of transport routes to be selected.
- Wafer size can be changed only by recipe settings, making it very easy to change wafer size.
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Product
Ashing device Luminous NA series
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Handling Company
ULVAC Sales Co., Ltd.
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Categories
1 Models of Ashing device Luminous NA series
| Product Image | Part Number | Price (excluding tax) | Compatible wafer size |
|---|---|---|---|
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Luminous NA-8000 |
Available upon quote | 100mm,125mm,150mm and 200mm |
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About Company Handling This Product
- Japan