High-density plasma dry etching equipment ULHITETM NE-7800H
ULVAC Sales Co., Ltd.
About This Product
■Summary
The high-density plasma dry etching system ULHITETM NE-7800H is a multi-chamber type low-pressure, high-density plasma that is compatible with etching difficult-to-etch materials (ferroelectrics, noble metals, magnetic films, etc.) used in FeRAM, MRAM, ReRAM, PCRAM, etc. This is an etching device.
■Applications
FeRAM, MRAM, ReRAM, CBRAM, PcRAM, etc.
■Features
・Magnetic field ICP (ISM) method - dedicated machine for processing non-volatile materials using low-pressure, high-density plasma
・Providing etching solutions ranging from room temperature to high temperature (400°C) laminated film batch etching and hard mask removal.
- Measures against deposits by uniform heating from chamber to exhaust line to DRP.
・Mass production equipment with extensive experience in etching non-volatile materials, including structures, materials, and heating mechanisms that reduce maintenance and cleaning costs and particle generation.
・Achieves long-term reproducibility and stability.
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Product
High-density plasma dry etching equipment ULHITETM NE-7800H
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Handling Company
ULVAC Sales Co., Ltd.
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Categories
1 Models of High-density plasma dry etching equipment ULHITETM NE-7800H
| Product Image | Part Number | Price (excluding tax) | Deposition measures | Device configuration | Film type | In-plane uniformity | Plasma source | Process recipe editing method | Processable substrate size | Substrate electrode temperature |
|---|---|---|---|---|---|---|---|---|---|---|
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ULHITETM NE-7800H |
Available upon quote | Faraday shield mechanism/top plate heating mechanism/anti-adhesion plate heating mechanism, etc. |
Cassette chamber/autoloader Transfer room etching chamber Preheating chamber (optional) Pre/post treatment room (optional) |
Ferroelectric/high dielectric materials, magnetic materials, electrode materials, etc. | ±5% or less | ISM (Magnetic ICP) | Multi-step method | 6/8 inches | ~400℃±5℃ |
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About Company Handling This Product
- Japan